公开(公告)号：US20180119888A1

公开(公告)日：2018-05-03

申请号：US15573020

申请日：2016-05-11

申请人： ENTEGRIS, INC.

发明人： Daneil ELZER ,  Ying TANG ,  Barry Lewis CHAMBERS ,  Joseph D. SWEENEY ,  Shaun M. WILSON ,  Steven ULANECKI ,  Steven E. BISHOP ,  James V. MCMANUS ,  Karl W. OLANDER ,  Edward E. JONES ,  Oleg BYL ,  Joseph R. DESPRES ,  Christopher SCANNELL

IPC分类号： F17C13/04

CPC分类号： F17C13/04 ,  F17C11/00 ,  F17C2201/0114 ,  F17C2201/0119 ,  F17C2201/058 ,  F17C2203/0617 ,  F17C2205/0308 ,  F17C2205/0329 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0385 ,  F17C2205/0391

摘要： Fluid dispensing assemblies are disclosed, for use in fluid supply packages in which such fluid dispensing assemblies as coupled to fluid supply vessels, for dispensing of fluids such as semiconductor manufacturing fluids. The fluid dispensing assemblies in specific implementations are configured to prevent application of excessive force to valve elements in the fluid dispensing assemblies, and/or for avoiding inadvertent or accidental open conditions of vessels that may result in leakage of toxic or otherwise hazardous or valuable gas. Also described are alignment devices for assisting coupling of coupling elements, e.g., coupling elements of fluid supply packages of the foregoing type, so that damage to such couplings as a result of misalignment is avoided.

公开(公告)号：US20180023765A1

公开(公告)日：2018-01-25

申请号：US15549875

申请日：2016-02-12

申请人： ENTEGRIS, INC.

发明人： Joseph D. SWEENEY ,  Edward E. JONES ,  Joseph R. SPRES ,  Richard S. RAY ,  Peter C. VAN BUSKIRK ,  Edward A. STURM ,  Chris SCANNELL

IPC分类号： F17C13/02 ,  G06K19/06 ,  G06K19/07 ,  F17C11/00 ,  F17C13/00

CPC分类号： F17C13/026 ,  F17C11/00 ,  F17C13/003 ,  F17C13/02 ,  F17C2205/0338 ,  F17C2205/0391 ,  F17C2205/05 ,  F17C2205/054 ,  F17C2205/058 ,  F17C2250/0439 ,  F17C2270/0518 ,  G06K19/06037 ,  G06K19/0723

摘要： A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.

公开(公告)号：US20220108863A1

公开(公告)日：2022-04-07

申请号：US17492089

申请日：2021-10-01

申请人： Entegris, Inc.

发明人： Ying TANG ,  Joe R. DESPRES ,  Joseph D. SWEENEY ,  Oleg BYL ,  Barry Lewis CHAMBERS

IPC分类号： H01J37/08 ,  H01J37/32

摘要： Described are ion implantation devices, systems, and methods, and in particular to an ion source that is useful for generating an aluminum ion beam.

公开(公告)号：US20200011482A1

公开(公告)日：2020-01-09

申请号：US16577711

申请日：2019-09-20

申请人： ENTEGRIS, INC.

发明人： Joseph D. SWEENEY ,  Edward Edmiston JONES ,  Joseph Robert DESPRES ,  Richard S. RAY ,  Peter C. Van Buskirk ,  Edward A. STURM ,  Christopher SCANNELL

IPC分类号： F17C13/02 ,  F17C11/00 ,  F17C13/00 ,  G06K19/06 ,  G06K19/07

摘要： A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.

公开(公告)号：US20200248873A1

公开(公告)日：2020-08-06

申请号：US16855684

申请日：2020-04-22

申请人： ENTEGRIS, INC.

发明人： Daniel ELZER ,  Ying TANG ,  Barry L. CHAMBERS ,  Joseph D. SWEENEY ,  Shaun M. WILSON ,  Steven E. BISHOP ,  Steven ULANECKI ,  James V. MCMANUS ,  Oleg BYL ,  Christopher SCANNELL ,  Edward E. JONES ,  Joseph R. DESPRES

IPC分类号： F17C13/04 ,  F17C11/00

摘要： Fluid dispensing assemblies are disclosed, for use in fluid supply packages in which such fluid dispensing assemblies as coupled to fluid supply vessels, for dispensing of fluids such as semiconductor manufacturing fluids. The fluid dispensing assemblies in specific implementations are configured to prevent application of excessive force to valve elements in the fluid dispensing assemblies, and/or for avoiding inadvertent or accidental open conditions of vessels that may result in leakage of toxic or otherwise hazardous or valuable gas. Also described are alignment devices for assisting coupling of coupling elements, e.g., coupling elements of fluid supply packages of the foregoing type, so that damage to such couplings as a result of misalignment is avoided.

公开(公告)号：US20200083015A1

公开(公告)日：2020-03-12

申请号：US16564965

申请日：2019-09-09

申请人： ENTEGRIS, INC.

发明人： Joseph D. SWEENEY ,  Joseph R. DESPRES ,  Ying TANG ,  Sharad N. YEDAVE ,  Edward E. JONES ,  Oleg BYL

IPC分类号： H01J37/08 ,  H01J37/317

摘要： An ion source apparatus for ion implantation is described, including an ion source chamber, and a consumable structure in or associated with the ion source chamber, in which the consumable structure includes a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber, wherein the solid dopant source material comprises gallium nitride, gallium oxide, either of which may be isotopically enriched with respect to a gallium isotope, or combinations thereof.

公开(公告)号：US20210020402A1

公开(公告)日：2021-01-21

申请号：US16904286

申请日：2020-06-17

申请人： ENTEGRIS, INC.

发明人： Ying TANG ,  Sharad N. YEDAVE ,  Joseph R. DESPRES ,  Joseph D. SWEENEY ,  Oleg BYL

IPC分类号： H01J37/317 ,  H01J37/08

摘要： A system and method for ion implantation is described, which includes a gas or gas mixture including at least one ionizable gas used to generate ionic species and an arc chamber that includes two or more different arc chamber materials. Using the system ionic species are generated in the arc chamber with liner combination, and one or more desired ionic species display a higher beam current among the ionic species generated, which is facilitated by use of the different materials. In turn improved implantation of the desired ionic species into a substrate can be achieved. Further, the system can minimize formation of metal deposits during system operation, thereby extending source life and promoting improved system performance.

公开(公告)号：US20200088352A1

公开(公告)日：2020-03-19

申请号：US16375000

申请日：2019-04-04

申请人： ENTEGRIS, INC.

发明人： Joseph Robert DESPRES ,  Joseph D. SWEENEY ,  Edward A. STURM

IPC分类号： F17C11/00 ,  B01J20/22

摘要： Described are storage and dispensing vessels and related systems and methods, for dispensing reagent gas from a vessel in which the reagent gas is held in sorptive relationship to a solid adsorbent medium, the reagent gas being contained at super-atmospheric pressure and the solid adsorbent medium comprising a metal-organic framework.

公开(公告)号：US20190189402A1

公开(公告)日：2019-06-20

申请号：US16192416

申请日：2018-11-15

申请人： ENTEGRIS, INC.

发明人： Sharad N. YEDAVE ,  Ying TANG ,  Joseph R. DESPRES ,  Joseph D. SWEENEY

IPC分类号： H01J37/32 ,  H01J37/317 ,  H01J37/08

CPC分类号： H01J37/32449 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/31701

摘要： A gas supply assembly is described for delivery of gas to a plasma flood gun which includes an inert gas and a fluorine-containing gas, wherein the assembly is configured to deliver a volume of the fluorine-containing gas to the flood gun that is not greater than 10% of a total volume of the fluorine-containing and inert gasses. The fluorine-containing gas can generate volatile reaction product gases from material deposits in the plasma flood gun, and to effect re-metallization of a plasma generation filament in the plasma flood gun. In combination with the gas amounts, the assembly and methods can use gas flow rates to optimize the cleaning effect and reduce filament material loss from the plasma flood gun during use.

公开(公告)号：US20210398773A1

公开(公告)日：2021-12-23

申请号：US17466362

申请日：2021-09-03

申请人： Entegris, Inc.

发明人： Ying TANG ,  Sharad N. YEDAVE ,  Joseph R. DESPRES ,  Joseph D. SWEENEY ,  Oleg BYL

IPC分类号： H01J37/317 ,  H01J37/08

摘要： A system and method for ion implantation is described, which includes a gas or gas mixture including at least one ionizable gas used to generate ionic species and an arc chamber that includes two or more different arc chamber materials. Using the system ionic species are generated in the arc chamber with liner combination, and one or more desired ionic species display a higher beam current among the ionic species generated, which is facilitated by use of the different materials. In turn improved implantation of the desired ionic species into a substrate can be achieved. Further, the system can minimize formation of metal deposits during system operation, thereby extending source life and promoting improved system performance.