RODABLE PRESSURE COUPLING
    1.
    发明申请
    RODABLE PRESSURE COUPLING 审中-公开
    可变压力联轴器

    公开(公告)号:US20160175897A1

    公开(公告)日:2016-06-23

    申请号:US14871901

    申请日:2015-09-30

    IPC分类号: B08B9/027 F16L45/00

    摘要: A pressure transmitter coupling for coupling a pressure transmitter to a process fluid includes a process coupling face having a process coupling port configured to couple to impulse piping. A pressure transmitter coupling face is arranged at an angle to the process coupling face, the pressure transmitter coupling face including a pressure transmitter coupling port configured to fluidically couple to the pressure transmitter. A process fluid passageway extends between the process coupling port and the pressure transmitter coupling port. A rod out port is aligned with the process fluid coupling port and configured to receive a cleaning rod therethrough to clean the process coupling port.

    摘要翻译: 用于将压力变送器耦合到过程流体的压力变送器联接器包括具有被配置为耦合到脉冲管道的过程联接口的过程联接面。 压力变送器联接面以与过程联接面成一定角度布置,压力变送器联接面包括压力变送器联接口,该压力变送器联接口配置为流体耦合到压力变送器。 过程流体通道在过程联接口和压力变送器联接口之间延伸。 杆出口与过程流体联接口对准,并且构造成接收通过其中的清洁杆以清洁过程联接口。

    PROCESS MEASUREMENT PROBE BOTTOMING INDICATOR
    4.
    发明申请
    PROCESS MEASUREMENT PROBE BOTTOMING INDICATOR 有权
    过程测量探头底部指示器

    公开(公告)号:US20160084688A1

    公开(公告)日:2016-03-24

    申请号:US14489806

    申请日:2014-09-18

    IPC分类号: G01F1/46

    CPC分类号: G01F1/46 G01F15/18

    摘要: Systems and methods are disclosed for indicating bottoming contact between an inner wall of a fluid carrying conduit and a distal tip process measurement probe. A process device, such as a fluid flow meter, has a process measurement probe configured for insertion into the fluid carrying conduit. An insertion mechanism is coupled to the process measurement probe and configured to apply force to insert the process measurement probe into the fluid carrying conduit. A bottoming indicator is configured to provide an indication of proper bottoming of the distal tip of the process measurement probe against the inner wall of the fluid carrying conduit as a function of an insertion related force or pressure.

    摘要翻译: 公开了用于指示流体输送管道的内壁和远端尖端过程测量探针之间的底部接触的系统和方法。 诸如流体流量计的过程装置具有构造成用于插入流体输送导管中的过程测量探针。 插入机构联接到过程测量探针并且被配置成施加力以将过程测量探针插入到流体承载导管中。 底部指示器构造成作为插入相关力或压力的函数提供过程测量探针的远端的适当底部的指示,以抵靠流体承载导管的内壁。

    Wafer alignment device
    5.
    发明授权

    公开(公告)号:US09846022B2

    公开(公告)日:2017-12-19

    申请号:US14865057

    申请日:2015-09-25

    IPC分类号: G01B5/25

    CPC分类号: G01B5/25 F16L23/003 G01F15/18

    摘要: An alignment device for a wafer in an industrial process assembly includes an inner surface shaped to conform to an outer surface of a wafer, an outer surface comprising at least two cams; and two ends connecting the inner surface to the outer surface. The two ends are positioned such that when the alignment device is positioned on the outer surface of the wafer, the alignment device extends more than one hundred eighty degrees around the wafer.

    Process measurement probe bottoming indicator
    6.
    发明授权
    Process measurement probe bottoming indicator 有权
    过程测量探针底部指示器

    公开(公告)号:US09383236B2

    公开(公告)日:2016-07-05

    申请号:US14489806

    申请日:2014-09-18

    IPC分类号: G01F15/00 G01F1/46

    CPC分类号: G01F1/46 G01F15/18

    摘要: Systems and methods are disclosed for indicating bottoming contact between an inner wall of a fluid carrying conduit and a distal tip process measurement probe. A process device, such as a fluid flow meter, has a process measurement probe configured for insertion into the fluid carrying conduit. An insertion mechanism is coupled to the process measurement probe and configured to apply force to insert the process measurement probe into the fluid carrying conduit. A bottoming indicator is configured to provide an indication of proper bottoming of the distal tip of the process measurement probe against the inner wall of the fluid carrying conduit as a function of an insertion related force or pressure.

    摘要翻译: 公开了用于指示流体输送管道的内壁和远端尖端过程测量探针之间的底部接触的系统和方法。 诸如流体流量计的过程装置具有构造成用于插入流体输送导管中的过程测量探针。 插入机构联接到过程测量探针并且被配置成施加力以将过程测量探针插入到流体承载导管中。 底部指示器构造成作为插入相关力或压力的函数提供过程测量探针的远端的适当底部的指示,以抵靠流体承载导管的内壁。

    WAFER ALIGNMENT DEVICE
    9.
    发明申请

    公开(公告)号:US20170089685A1

    公开(公告)日:2017-03-30

    申请号:US14865057

    申请日:2015-09-25

    IPC分类号: G01B5/25

    CPC分类号: G01B5/25 F16L23/003 G01F15/18

    摘要: An alignment device for a wafer in an industrial process assembly includes an inner surface shaped to conform to an outer surface of a wafer, an outer surface comprising at least two cams; and two ends connecting the inner surface to the outer surface. The two ends are positioned such that when the alignment device is positioned on the outer surface of the wafer, the alignment device extends more than one hundred eighty degrees around the wafer.

    FLOW MEASUREMENT PROBE
    10.
    发明申请
    FLOW MEASUREMENT PROBE 有权
    流量测量探头

    公开(公告)号:US20160091355A1

    公开(公告)日:2016-03-31

    申请号:US14501571

    申请日:2014-09-30

    IPC分类号: G01F7/00 G01F1/68 G01F1/46

    摘要: A flow measurement probe includes an elongate probe having an averaging pitot tube with a plurality of upstream and downstream openings arranged along a length of the elongate probe, and a thermal flow measurement sensor coupled to the elongate probe. A method of measuring fluid flow rate in a process includes calculating a flow rate of the fluid using differential pressure in upstream and downstream openings of an averaging pitot tube in an elongate probe when the differential pressure is at least a defined measurement threshold, and calculating the flow rate of the fluid with a thermal mass flow sensor coupled to the flow measurement probe when the differential pressure is less than the defined measurement threshold.

    摘要翻译: 流量测量探头包括具有平均皮托管的细长探针,其具有沿着细长探针的长度布置的多个上游和下游开口,以及耦合到细长探针的热流测量传感器。 在流程中测量流体流速的方法包括当差压至少为定义的测量阈值时,在细长探针中的平均皮托管的上游和下游开口中使用差压计算流体的流量,并计算 当差压小于所定义的测量阈值时,具有耦合到流量测量探针的热质量流量传感器的流体的流速。