公开(公告)号：US5818564A

公开(公告)日：1998-10-06

申请号：US713909

申请日：1996-09-13

Applicant: David C. Gray ,  Dana C. Chase, Jr.

Inventor： David C. Gray ,  Dana C. Chase, Jr.

IPC: G02F1/1333 ,  G02F1/133 ,  G02F1/136

CPC classification number: G02F1/133385 ,  G02F1/136

Abstract: An assembly for dissipating heat from an active matrix liquid crystal display module while avoiding developing thermally induced mechanical stresses which can adversely affect the electro-optical properties of the liquid crystal material is disclosed. The module is affixed to a circuit board containing electrical leads for connection to drive electronics, in a way such that the substrate containing the active matrix elements is suspended through a window or through-hole in the circuit board and is sunken or nested into a soft elastomeric gel which is electrically non-conductive but thermally conductive. The gel provides the requisite thermal conductivity to dissipate the heat via a heat sink with which the gel is in thermal contact.

Abstract translation: 公开了一种用于从有源矩阵液晶显示模块散热的组件，同时避免产生可能不利地影响液晶材料的电光性能的热致机械应力。 该模块固定在电路板上，该电路板包含用于连接到驱动电子设备的电引线，使得含有有源矩阵元件的基板悬挂在电路板中的窗口或通孔中，并且被凹陷或嵌套成软 弹性凝胶是不导电但导热的。 凝胶提供必要的热导率，以通过与凝胶热接触的散热器来散热。

公开(公告)号：US5350480A

公开(公告)日：1994-09-27

申请号：US96928

申请日：1993-07-23

Applicant: David C. Gray

Inventor： David C. Gray

IPC: H01L21/00 ,  H01L21/306

CPC classification number: H01L21/02071 ,  H01L21/67028 ,  Y10S134/902

Abstract: An apparatus for generating large arrays of directed beams containing thermally excited, electrically neutral gas species, including vibrationally excited molecules, free radicals, and atoms, is disclosed. A heated plate in which a designed array of long, narrow channels are formed serves both to activate and collimate the gas species, and separates a high pressure reservoir of reactive gas from an evacuated region which serves as the material processing chamber. Selection of the appropriate reservoir pressure and channel geometry facilitates the thermal excitation of the reactive gas through collisions with hot channel walls, and the formation of directed non-collisional beams which may be readily transported through the evacuated chamber. The heated channel array plate is designed to allow good gas flux uniformity over a large target area by appropriately setting the pitch spacing and aspect ratio of the channels. Impingement of the thermally excited neutral gas species on a target material allows cleaning of surface contaminations and residues, removal of material surface layers without causing ballistic damage, or reactive modification of the surface layers. The directionality or angular divergence of the beams may be tuned to adjust the anisotropy of the surface cleaning and/or etching, allowing transport of thermally excited species into high aspect ratio target surface structures.

Abstract translation: 公开了一种用于产生包含热激发的电中性气体物质的包括振动激发的分子，自由基和原子的大阵列的定向束的装置。 其中形成有长而窄的通道的设计阵列的加热板用于激活和准直气体种类，并将反应气体的高压储存器与用作材料处理室的抽空区域分开。 选择适当的储层压力和通道几何形状有助于通过与热通道壁碰撞的反应性气体的热激发，以及可以容易地通过真空室输送的定向非碰撞梁的形成。 加热的通道阵列板通过适当地设定通道的间距间距和纵横比来设计，以在大的目标区域上允许良好的气体通量均匀性。 在目标材料上引起热激发的中性气体物质，可以清除表面污染物和残留物，去除材料表面层而不会引起弹道损坏或表面层的反应性改性。 可以调整光束的方向性或角度发散以调节表面清洁和/或蚀刻的各向异性，从而允许将热激发物质运输到高纵横比目标表面结构中。

公开(公告)号：US07025831B1

公开(公告)日：2006-04-11

申请号：US09443663

申请日：1999-11-19

Applicant: Jeffery W. Butterbaugh ,  David C. Gray ,  Robert T. Fayfield ,  Kevin Siefering ,  John Heitzinger ,  Fred C. Hiatt

Inventor： Jeffery W. Butterbaugh ,  David C. Gray ,  Robert T. Fayfield ,  Kevin Siefering ,  John Heitzinger ,  Fred C. Hiatt

IPC: C23C16/48 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/31116 ,  C03C15/00 ,  C03C23/0075 ,  C23F1/00 ,  C23F1/12 ,  C23G5/00 ,  H01L21/02046 ,  H01L21/67115

Abstract: Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes reactive gas. The apparatus includes a support for supporting the substrate in the chamber, the substrate being in a lower pressure reaction region of the chamber. A gas inlet is provided for feeding conditioning gas into a gas inlet region of the chamber which is at a higher pressure than the lower pressure reaction region so that the pressure differential causes the conditioning gas to flow toward the surface of the substrate wherein the conditioning gas component will chemically react with and condition the substrate surface, both said higher and lower pressure regions operating in a viscous flow regime. The substrate is supported such that a pressure bias is created across the surface of this substrate so that the gas, after it has chemically reacted with the substrate surface, flows outward from where it has reacted, off the substrate toward the periphery of the chamber and out a peripheral or central underside exhaust outlet. Gas feed may be provided to one or both sides the substrate and light activation of the substrate or conditioning gas may be provided on one or both sides.

Abstract translation: 用于调理大体上平面的基底的装置和方法，包含在可与周围环境隔离的室中并供给包括反应气体的调节气体。 该装置包括用于在腔室中支撑衬底的支撑件，衬底处于室的较低压力反应区域中。 提供了一个气体入口，用于将调节气体输送到腔室的气体入口区域中，该气体入口区域处于比低压反应区域更高的压力，使得压力差导致调节气体朝向衬底的表面流动，其中调节气体 所述组分将在粘性流动状态下操作的所述较高压力区域和较低压力区域将与底物表面发生化学反应和调节。 支撑衬底，使得在该衬底的表面上形成压力偏压，使得气体在其与衬底表面发生化学反应之后从其已经反应的位置向外流动，离开衬底朝向腔室的周边，并且 外围或中央下侧排气口。 可以将气体进料提供给基材的一侧或两侧，并且可以在一侧或两侧设置基材或调理气体的光活化。

公开(公告)号：US06124211A

公开(公告)日：2000-09-26

申请号：US541634

申请日：1995-10-10

Applicant: Jeffery W. Butterbaugh ,  David C. Gray ,  Robert T. Fayfield

Inventor： Jeffery W. Butterbaugh ,  David C. Gray ,  Robert T. Fayfield

IPC: C30B33/12 ,  B08B7/00 ,  C03C15/00 ,  C03C23/00 ,  C23C16/02 ,  C23F1/12 ,  C23F4/00 ,  C23G5/00 ,  H01L21/302 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/32 ,  H01L21/3213 ,  H01L21/00

CPC classification number: H01L21/02046 ,  B08B7/0057 ,  C03C15/00 ,  C03C23/002 ,  C23C16/0236 ,  H01L21/02063 ,  H01L21/31116 ,  H01L21/32

Abstract: A method for removing native oxides and other contaminants from a wafer surface while minimizing the loss of a desired film on the wafer surface. The method is carried out in a hermetically sealed reactor. A fluorine-containing gas or gas mixture is passed over the wafer during simultaneous exposure to ultraviolet radiation in the absence of added water, hydrogen, hydrogen fluoride or hydrogen containing organics, thereby avoiding the production of water as a reaction product. The addition of ultraviolet radiation and the elimination of water, hydrogen, hydrogen fluoride and hydrogen containing organics provides for the nearly equivalent (non-selective) removal of various forms of oxide and also provides for improved process control.

Abstract translation: 一种从晶片表面去除天然氧化物和其它污染物同时最小化晶片表面上期望的膜的损耗的方法。 该方法在密封的反应器中进行。 在不加入水，氢气，氟化氢或含氢的有机物的同时暴露于紫外线辐射下，含氟气体或气体混合物通过晶片，从而避免产生作为反应产物的水。 添加紫外线辐射和消除​​水，氢，氟化氢和含氢有机物提供了几乎等同（非选择性）去除各种形式的氧化物，并且还提供改进的过程控制。

公开(公告)号：US6015503A

公开(公告)日：2000-01-18

申请号：US860071

申请日：1997-09-02

Applicant: Jeffery W. Butterbaugh ,  David C. Gray ,  Robert T. Fayfield ,  Kevin Siefering ,  John Heitzinger ,  Fred C. Hiatt

Inventor： Jeffery W. Butterbaugh ,  David C. Gray ,  Robert T. Fayfield ,  Kevin Siefering ,  John Heitzinger ,  Fred C. Hiatt

IPC: B08B7/00 ,  H01L21/00 ,  H01L21/306 ,  H01L21/311 ,  C23F1/12

CPC classification number: H01L21/02046 ,  B08B7/0057 ,  H01L21/31116 ,  H01L21/67017 ,  H01L21/67115 ,  Y10S438/935

Abstract: Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes a reactive gas. The apparatus includes a support for supporting the substrate in the chamber, the substrate being in a lower pressure reaction region of the chamber. A gas inlet is provided for feeding conditioning gas into a gas inlet region of the chamber which is at a higher pressure than the lower pressure reaction region so that the pressure differential causes the conditioning gas to flow toward the surface of the substrate wherein the conditioning gas component will chemically react with and condition the substrate surface, both said higher and lower pressure regions operating in a viscous flow regime. The substrate is supported such that a pressure bias is created across the surface of the substrate so that the gas, after it has chemically reacted with the substrate surface, flows outward from where it has reacted, off the substrate toward the periphery of the chamber and out a peripheral or central underside exhaust outlet. Gas feed may be provided to one or both sides of the substrate and light activation of the substrate or conditioning gas may be provided on one or both sides.

Abstract translation: PCT No.PCT / US95 / 16649 Sec。 371日期：1997年9月2日 102（e）1997年9月2日PCT 1995年12月21日PCT PCT。 公开号WO96 / 198252 日期1996年6月27日用于调节大体上平面的基板的装置和工艺，该基板包含在可与周围环境隔离并且供给包括反应气体的调节气体的室中。 该装置包括用于在腔室中支撑衬底的支撑件，衬底处于室的较低压力反应区域中。 提供了一个气体入口，用于将调节气体输送到腔室的气体入口区域中，该气体入口区域处于比低压反应区域更高的压力，使得压力差导致调节气体朝向衬底的表面流动，其中调节气体 所述组分将在粘性流动状态下操作的所述较高压力区域和较低压力区域将与底物表面发生化学反应和调节。 支撑衬底使得跨越衬底的表面产生压力偏压，使得气体在其与衬底表面发生化学反应之后从其已经反应的气体向外流出，离开衬底朝向室的周边，并且 外围或中央下侧排气口。 可以将气体进料提供到基底的一侧或两侧，并且可以在一侧或两侧设置基底或调理气体的光激活。

公开(公告)号：US5782986A

公开(公告)日：1998-07-21

申请号：US584179

申请日：1996-01-11

Applicant: Jeffery W. Butterbaugh ,  David C. Gray

Inventor： Jeffery W. Butterbaugh ,  David C. Gray

IPC: C23F1/12 ,  H01L21/302 ,  H01L21/306 ,  H01L21/308 ,  B08B7/00

CPC classification number: H01L21/02046 ,  C23F1/12

Abstract: UV irradiation enhances oxidation of metal and/or formation of sublimable ligand compounds using beta-diketone or beta-ketoimine ligand forming compounds. A UV/halogen gas or UV/ozone treatment can be used to efficiently oxidize the metallic material to a suitable form for reaction with the ligand forming compound and UV irradiation can be used during exposure to the ligand forming compound to enhance the formation of sublimable ligand compounds. Oxidization and ligand compound formation can be run sequentially or simultaneously. The process can be used for bulk metals removal, metal film patterning or trace metals removal.

Abstract translation: UV照射使用β-二酮或β-酮亚胺配体形成化合物增强金属的氧化和/或可升华配体化合物的形成。 可以使用UV /卤素气体或UV /臭氧处理来有效地将金属材料氧化成与配体形成化合物反应的合适形式，并且可以在暴露于配体形成化合物期间使用UV辐射以增强升华配体的形成 化合物。 氧化和配体化合物的形成可以顺序或同时进行。 该方法可用于块状金属去除，金属膜图案化或痕量金属去除。

公开(公告)号：US5580421A

公开(公告)日：1996-12-03

申请号：US360387

申请日：1994-12-21

Applicant: C. Fred Hiatt ,  David C. Gray ,  Jeffery W. Butterbaugh

Inventor： C. Fred Hiatt ,  David C. Gray ,  Jeffery W. Butterbaugh

IPC: H01L21/302 ,  B08B7/00 ,  C23C16/02 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/32

CPC classification number: H01L21/02046 ,  B08B7/0057 ,  C23C16/0236 ,  H01L21/31116 ,  H01L21/32 ,  H01L21/67017 ,  H01L21/67115 ,  Y10S438/935

Abstract: Apparatus and process for conditioning a substrate, contained in a hermetically sealed chamber fed with a conditioning gas which includes a reactive gas, the apparatus including a support for supporting the substrate in the chamber, the substrate being in a lower pressure reaction region of the chamber. A gas inlet is provided for feeding conditioning gas into a gas inlet region of the chamber which is at a higher pressure than the lower pressure reaction region so that the pressure differential causes the conditioning gas to flow toward the surface of the substrate wherein the conditioning gas component will chemically react with and condition the substrate surface, both said higher and lower pressure regions operating in a viscous flow regime. The substrate is supported such that a pressure bias is created across the surface of the substrate such that the gas, after it has chemically reacted with the substrate surface, flows radially outward from where it has reacted, toward the nearest edge of the substrate and out an exhaust outlet.

Abstract translation: 用于调节衬底的装置和方法，所述衬底包含在馈送有包括反应性气体的调节气体的气密密封室中，所述设备包括用于在腔室中支撑衬底的支撑件，衬底处于腔室的较低压力反应区域 。 提供了一个气体入口，用于将调节气体输送到腔室的气体入口区域中，该气体入口区域处于比低压反应区域更高的压力，使得压力差导致调节气体朝向衬底的表面流动，其中调节气体 所述组分将在粘性流动状态下操作的所述较高压力区域和较低压力区域将与底物表面发生化学反应和调节。 支撑衬底，使得在衬底的表面上产生压力偏压，使得气体在与衬底表面发生化学反应之后，已经从其已经反应的位置径向向外流动到衬底的最接近的边缘 排气口。

公开(公告)号：US20150231005A1

公开(公告)日：2015-08-20

申请号：US14476447

申请日：2014-09-03

Applicant: David C. Gray

Inventor： David C. Gray

IPC: A61G5/14 ,  A61G5/04

CPC classification number: A61G5/14 ,  A61G5/04 ,  A61G7/1017 ,  A61G7/1048 ,  A61G7/1051 ,  A61G7/1096 ,  A61G7/1098 ,  A61G2200/34 ,  A61G2200/36 ,  A61G2203/14

Abstract: A mobility device with sit and stand assist for providing disabled individuals with the ability to rise from a sitting position and move about without the aid of an assistant. The mobility device with sit and stand assist generally includes a motorized and steerable Drive Carriage Assembly, a Trailing Cart Assembly attached to the Drive Carriage Assembly, an Outrigger Assembly attached to the Trailing Cart Assembly, a Lift Arm Assembly attached to the Outrigger Assembly, a Lift Arm Locking Bolt Assembly attached to the Lift Arm Assembly, a Knee Brace Assembly attached to the Trailing Cart Assembly, a Control Assembly attached to the Lift Arm Assembly, and a User Connection Group comprised of various components designed to enable the user to comfortably connect himself/herself to the Device such that the user might be able to utilize and benefit from the Device.

Abstract translation: 一个移动设备，坐着和支持帮助，为残疾人提供从座位上升的能力，而不需要助手的帮助。 具有坐姿和支架辅助功能的移动设备通常包括机动化和可操纵的驱动支架组件，附接到驱动支架组件的跟踪车组件，附接到跟踪车组件的外伸支架组件，附接到支腿组件的升降臂组件 提升臂锁定螺栓组件，其连接到提升臂组件，附接到跟踪车组件的膝盖支架组件，附接到提升臂组件的控制组件以及由各种部件组成的用户连接组，所述组件被设计成使得用户能够舒适地连接 他/她自己到设备，使得用户可能能够利用和受益于设备。

公开(公告)号：US20140109312A1

公开(公告)日：2014-04-24

申请号：US14054157

申请日：2013-10-15

Applicant: David C. Gray

Inventor： David C. Gray

IPC: A61G5/14 ,  A61G5/04

CPC classification number: A61G5/14 ,  A61G5/04 ,  A61G7/1017 ,  A61G7/1048 ,  A61G7/1051 ,  A61G7/1096 ,  A61G7/1098 ,  A61G2200/34 ,  A61G2200/36 ,  A61G2203/14

Abstract: A mobility device with sit and stand assist for providing disabled individuals with the ability to rise from a sitting position and move about without the aid of an assistant. The mobility device with sit and stand assist generally includes a motorized and steerable Drive Carriage Assembly, a Trailing Cart Assembly attached to the Drive Carriage Assembly, an Outrigger Assembly attached to the Trailing Cart Assembly, a Lift Arm Assembly attached to the Outrigger Assembly, a Lift Arm Locking Bolt Assembly attached to the Lift Arm Assembly, a Knee Brace Assembly attached to the Trailing Cart Assembly, a Control Assembly attached to the Lift Arm Assembly, and a User Connection Group comprised of various components designed to enable the user to comfortably connect himself/herself to the Device such that the user might be able to utilize and benefit from the Device.

Abstract translation: 一个移动设备，坐着和支持帮助，为残疾人提供从座位上升的能力，而不需要助手的帮助。 具有坐姿和支架辅助功能的移动设备通常包括机动化和可操纵的驱动支架组件，附接到驱动支架组件的跟踪车组件，附接到跟踪车组件的外伸支架组件，附接到支腿组件的升降臂组件 提升臂锁定螺栓组件，其连接到提升臂组件，附接到跟踪车组件的膝盖支架组件，附接到提升臂组件的控制组件以及由各种部件组成的用户连接组，所述组件被设计成使得用户能够舒适地连接 他/她自己到设备，使得用户可能能够利用和受益于设备。

公开(公告)号：US5716495A

公开(公告)日：1998-02-10

申请号：US621538

申请日：1996-03-25

Applicant: Jeffery W. Butterbaugh ,  David C. Gray

Inventor： Jeffery W. Butterbaugh ,  David C. Gray

IPC: C30B33/12 ,  B08B7/00 ,  C03C15/00 ,  C03C23/00 ,  C23C16/02 ,  C23F1/12 ,  H01L21/302 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/32 ,  B44C1/22 ,  C03C25/06

CPC classification number: H01L21/02046 ,  B08B7/0057 ,  C03C15/00 ,  C03C23/002 ,  C23C16/0236 ,  H01L21/02063 ,  H01L21/31116 ,  H01L21/32

Abstract: A method for removing native oxides and other contaminants from a wafer surface while minimizing the loss of a desired film on the wafer surface. The method is carried out in a hermetically sealed reactor. A fluorine-containing gas or gas mixture is passed over the wafer during simultaneous exposure to ultraviolet radiation in the absence of added water, hydrogen, hydrogen fluoride or hydrogen containing organics, thereby avoiding the production of water as a reaction product. The addition of ultraviolet radiation and the elimination of water, hydrogen, hydrogen fluoride and hydrogen containing organics provides for the nearly equivalent (non-selective) removal of various forms of oxide and also provides for improved process control.