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    THINNER COMPOSITION
    1.
    发明申请
    THINNER COMPOSITION 审中-公开
    薄膜组成

    公开(公告)号：US20170059987A1

    公开(公告)日：2017-03-02

    申请号：US15251003

    申请日：2016-08-30

    Applicant: DONGWOO FINE-CHEM CO., LTD.

    Inventor： Cheol Min CHOI ,  In Kak SONG ,  Kyong Ho LEE

    IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039

    CPC classification number: G03F7/0048 ,  G03F7/038 ,  G03F7/039 ,  G03F7/162 ,  G03F7/168

    Abstract: A thinner composition includes propyleneglycol alkylether acetate, cycloketone, and methyl 2-hydroxy isobutyrate. The thinner composition has excellent EBR, RRC, and rework properties, as well as effects of improving photoresist application uniformity, and in particular, exhibiting excellent solubility to photoresist having a high polarity, so as to be applicable to various photoresists.

    Abstract translation: 较薄的组合物包括丙二醇烷基醚乙酸酯，环酮和2-羟基异丁酸甲酯。 更薄的组成具有优异的EBR，RRC和返工性能，以及改善光致抗蚀剂施加均匀性的效果，特别是对具有高极性的光致抗蚀剂表现出优异的溶解性，以适用于各种光致抗蚀剂。

    ANTENNA STRUCTURE
    2.
    发明申请
    ANTENNA STRUCTURE 有权

    公开(公告)号：US20220416410A1

    公开(公告)日：2022-12-29

    申请号：US17848888

    申请日：2022-06-24

    Applicant: DONGWOO FINE-CHEM CO., LTD.

    Inventor： Young Ju KIM ,  Yoon Ho HUH ,  Hee Jun PARK ,  Young Su LEE ,  In Kak SONG ,  Dong Pil PARK

    IPC: H01Q1/42 ,  H01Q1/22 ,  H01Q1/38

    Abstract: An antenna structure according to an embodiment of the present invention includes a first antenna unit including a first radiator, a first transmission line connected to the first radiator, and a guide pattern disposed around the first transmission line and separated from the first transmission line, a second antenna unit at least partially covered by the guide pattern of the first antenna unit in a plan view, and a dielectric layer interposed between the first antenna unit and the second antenna unit. An antenna structure implementing low-frequency and high-frequency properties with high reliability is provided.

    THINNER COMPOSITION
    3.
    发明申请
    THINNER COMPOSITION 有权
    薄膜组成

    公开(公告)号：US20160230129A1

    公开(公告)日：2016-08-11

    申请号：US15016524

    申请日：2016-02-05

    Applicant: DONGWOO FINE-CHEM CO., LTD.

    Inventor： Cheol Min CHOI ,  In Kak SONG ,  Kyong Ho LEE

    IPC: C11D7/50 ,  C11D11/00

    CPC classification number: G03F7/168 ,  G03F7/162

    Abstract: A thinner composition includes propyleneglycol C1-C10 alkylether, C1-C10 alkyl C1-C10 alkoxy propionate, and C1-C10 alkyl lactate, thereby is it possible to improve applicability of a photoresist while remarkably reducing an amount of the used photoresist, as well as having excellent solubility and EBR property to various photoresists, BARCs and underlayers.

    Abstract translation: 更薄的组成包括丙二醇C1-C10烷基醚，C1-C10烷基C1-C10烷氧基丙酸酯和C1-C10烷基乳酸酯，从而可以改善光致抗蚀剂的适用性，同时显着减少所用光致抗蚀剂的量，以及 对各种光致抗蚀剂，BARC和底层具有优异的溶解性和EBR性能。

    THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST
    4.
    发明申请
    THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST 有权
    用于改善涂层和去除耐腐蚀性能的薄膜组合物

    公开(公告)号：US20150355545A1

    公开(公告)日：2015-12-10

    申请号：US14736018

    申请日：2015-06-10

    Applicant: DONGWOO FINE-CHEM CO., LTD.

    Inventor： Jeong Hwan KIM ,  Kyong Ho LEE ,  In Kak SONG

    IPC: G03F7/09 ,  G03F7/16

    CPC classification number: G03F7/422 ,  C11D3/2068 ,  C11D11/0047 ,  G03F7/09 ,  G03F7/16 ,  G03F7/168 ,  H01L21/02282

    Abstract: Provided are a thinner composition for improving coating property of a resist and for removing the same, which includes 10 to 80 wt. % of alkyl (with 1 to 5 carbon atoms) 2-hydroxyisobutyrate, 20 to 90 wt. % of propyleneglycol alkyl (with 1 to 5 carbon atoms)ether acetate, and 10 to 1000 ppm of a surfactant represented by Formula 1 to a total weight of the alkyl 2-hydroxyisobutyrate and propyleneglycol alkylether acetate, so as to achieve excellent solubility to various photoresists and bottom anti-reflective coatings (BARC) and high edge bead removing (EBR) performance, possibly be employed in a process for recycling photoresist-coated wafers, and remarkably improve coating property of the photoresist, and a method for manufacturing a semiconductor device or a thin film transistor liquid crystal display device including removal of the photoresist by using the above-described thinner composition.

    Abstract translation: 提供了一种用于改善抗蚀剂的涂层性能和用于除去抗蚀剂的较薄组合物，其包含10至80wt。 ％（具有1至5个碳原子）的2-羟基异丁酸酯，20至90重量％ ％的丙二醇烷基（具有1至5个碳原子）醚乙酸酯，和10至1000ppm的由式1表示的表面活性剂相对于2-羟基异丁酸烷基酯和丙二醇烷基醚乙酸酯的总重量，以便获得对各种 光致抗蚀剂和底部抗反射涂层（BARC）和高边缘珠粒去除（EBR）性能，可用于回收光致抗蚀剂涂覆的晶片的方法中，并且显着改善光致抗蚀剂的涂层性能，以及制造半导体器件的方法 或薄膜晶体管液晶显示装置，包括通过使用上述较薄组合物去除光致抗蚀剂。

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