Pin detector apparatus and method of fabrication
    1.
    发明授权
    Pin detector apparatus and method of fabrication 有权
    引脚检测装置及其制造方法

    公开(公告)号:US07052927B1

    公开(公告)日:2006-05-30

    申请号:US10765388

    申请日:2004-01-27

    IPC分类号: H01L21/00

    摘要: A PIN detector device (190) is fabricated on a substrate (10). The substrate (10) includes a handle wafer portion (208), an implanted oxide layer (206), a backside contact layer (204) and an active wafer portion (202). The substrate (10) serves as a foundation to increase stability and facilitate handling during fabrication of electrical circuitry (248) on a surface of the active wafer portion (202). After the electrical circuitry fabrication processing is substantially complete, the handle wafer portion (208) and implanted oxide layer (206) are removed to expose the implanted backside contact layer (204).

    摘要翻译: PIN检测器装置(190)被制造在衬底(10)上。 基板(10)包括手柄晶片部分(208),注入的氧化物层(206),背面接触层(204)和有源晶片部分(202)。 基板(10)用作增加稳定性的基础,并且在活动晶片部分(202)的表面上制造电路(248)期间便于处理。 在电路制造处理基本上完成之后,去除处理晶片部分(208)和注入的氧化物层(206)以暴露植入的背面接触层(204)。

    Radiation hardened visible P-I-N detector
    2.
    发明授权
    Radiation hardened visible P-I-N detector 有权
    辐射硬化的可见P-I-N探测器

    公开(公告)号:US06927383B2

    公开(公告)日:2005-08-09

    申请号:US10207422

    申请日:2002-07-26

    摘要: Disclosed is a method for producing an array (20) of p-intrinsic-n light detectors, as is an array produced in accordance with the method. The method includes providing a wafer (1); forming a first layer (2) having a first type of electrical conductivity (e.g., n-type) over a surface of the wafer; forming a second layer (3) that is an intrinsic layer on the first layer and, for each light detector, implanting or diffusing a region (9A) into a surface of the second layer that is opposite the surface on the first layer, the region (9A) having a second type of electrical conductivity (e.g., p-type). The method further includes forming an opening or aperture, referred to herein as a V-groove (6), through the second layer at least to the first layer; and electrically contacting with a first electrical contact (15, 9B, 13B) the first layer through the V-groove. The method further electrically contacts each of the regions with an associated one of a second electrical contact (13A), where the first and second electrical contacts are located on a same, non-radiation receiving surface of the array. In a preferred embodiment the steps of electrically contacting each comprise forming an Indium bump, and further comprise hybridizing the array with a readout integrated circuit (30). In the preferred embodiment forming the first layer over the surface of the wafer includes growing a doped epitaxial layer over the surface of the wafer, or it may include implanting the first layer into the surface of the wafer. Forming the second layer on the first layer includes growing an intrinsic epitaxial layer on the first layer to a thickness of, for example 10 microns. The wafer is thinned, either mechanically, or chemically, or by both processes.

    摘要翻译: 公开了一种用于制造p-本征n光检测器的阵列(20)的方法,根据该方法制造的阵列也是如此。 该方法包括提供晶片(1); 在所述晶片的表面上形成具有第一类导电性(例如,n型)的第一层(2); 形成作为第一层上的本征层的第二层(3),并且对于每个光检测器,将区域(9A)注入或扩散到与第一层上的表面相对的第二层的表面中, 具有第二类导电性的区域(例如,p型)。 该方法还包括至少形成至少到第一层的通过第二层形成开口或孔,这里称为V形槽(6); 并且通过V形槽与第一电触头(15,9B,13B)电接触第一层。 该方法通过第二电触点(13A)中的相关联的一个进一步电接触每个区域,其中第一和第二电触点位于阵列的相同的​​非辐射接收表面上。 在优选实施例中,电接触的步骤包括形成铟凸块,还包括将阵列与读出集成电路(30)杂交。 在优选实施例中,在晶片表面上形成第一层包括在晶片的表面上生长掺杂的外延层,或者其可以包括将第一层注入晶片的表面。 在第一层上形成第二层包括在第一层上生长厚度为例如10微米的本征外延层。 晶片通过机械或化学方式或两种方法进行薄化。

    Method for fabricating a high performance PIN focal plane structure using three handle wafers
    4.
    发明授权
    Method for fabricating a high performance PIN focal plane structure using three handle wafers 有权
    使用三个手柄晶片制造高性能PIN焦平面结构的方法

    公开(公告)号:US07504277B2

    公开(公告)日:2009-03-17

    申请号:US11248366

    申请日:2005-10-12

    IPC分类号: H01L21/00

    摘要: The present invention concerns, in part, a method for fabricating a silicon PIN detector component wherein three handle wafers are bonded to the wafer at varying points in the fabrication process. The utilization of three handle wafers during fabrication significantly ease handling concerns associated with what would otherwise be a relatively thin and fragile wafer, providing a stable and strong base for supporting those portions of the wafer that will constitute the PIN detector component. In a variant of the present invention, the third handle wafer comprises an optical element transparent in the wavelength of interest.

    摘要翻译: 本发明部分涉及一种用于制造硅PIN检测器部件的方法,其中三个处理晶片在制造过程的不同点处结合到晶片。 在制造过程中三个处理晶片的利用显着地减轻了与否将是相对薄且脆弱的晶片相关联的处理问题,为构成PIN检测器部件的晶片的那些部分提供了稳定和坚固的基底。 在本发明的变型中,第三处理晶片包括在感兴趣的波长下透明的光学元件。