公开(公告)号：US06540921B1

公开(公告)日：2003-04-01

申请号：US09690853

申请日：2000-10-18

申请人： Christine Devos ,  Didier Demay ,  Hervé Dulphy

发明人： Christine Devos ,  Didier Demay ,  Hervé Dulphy

IPC分类号： C02F142

CPC分类号： B01J47/028 ,  B01J47/06 ,  C01B15/0135

摘要： Process for the on-site purification of an aqueous hydrogen peroxide solution, in which the solution is made to pass through a resin bed capable, at least partially, of adsorbing or absorbing the impurities present in the solution. The hydrogen peroxide solution is injected into the resin bed and passes through the latter at an approximately linear velocity preferably of between 10 m/h and 50 m/h and more preferably between 10 m/h and 20 m/h, while the resin bed is kept substantially compacted for at least 50% of the time during which the solution is being purified by coming into contact with the said resin.

摘要翻译： 用于现场纯化过氧化氢水溶液的方法，其中使溶液通过至少部分吸附或吸收溶液中存在的杂质的树脂床。 将过氧化氢溶液注入树脂床中，以约10m / h〜50m / h，更优选为10m / h〜20m / h的大致线速度通过树脂床，同时树脂床 在通过与所述树脂接触来净化溶液的至少50％的时间内保持基本上压实。

公开(公告)号：US20100155222A1

公开(公告)日：2010-06-24

申请号：US12719346

申请日：2010-03-08

申请人： Jean-Christophe ROSTAING ,  Daniel Guerin ,  Christian Larquet ,  Chun-Hao Ly ,  Michel Moisan ,  Hervé Dulphy

发明人： Jean-Christophe ROSTAING ,  Daniel Guerin ,  Christian Larquet ,  Chun-Hao Ly ,  Michel Moisan ,  Hervé Dulphy

IPC分类号： B01J19/08

CPC分类号： B01D53/70 ,  B01D53/323 ,  B01D2259/818 ,  B01J2219/0875 ,  B01J2219/0894 ,  C23C16/4412 ,  Y02C20/30

摘要： The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.

摘要翻译： 本发明涉及用于用等离子体处理诸如PFC或HFC的气体的系统，包括：（6）泵出装置（6），其出口压力基本上等于大气压，等离子体发生器（8），在泵输出处， 以在大气压下产生等离子体。

公开(公告)号：US20090314626A1

公开(公告)日：2009-12-24

申请号：US12281303

申请日：2007-02-26

申请人： Pascal Moine ,  Hervé Dulphy ,  Christian Larquet ,  Aicha El-Krid ,  Daniel Guerin ,  Jean-Christophe Rostaing ,  Anne-Laure Lesort ,  Etienne Sandre

发明人： Pascal Moine ,  Hervé Dulphy ,  Christian Larquet ,  Aicha El-Krid ,  Daniel Guerin ,  Jean-Christophe Rostaing ,  Anne-Laure Lesort ,  Etienne Sandre

IPC分类号： B01D53/32 ,  B01D53/70 ,  B01J19/08

CPC分类号： B01D53/323 ,  B01D53/70 ,  B01D2257/2066 ,  B01D2259/818 ,  Y02C20/30

摘要： The invention relates to a method for destroying effluents issuing from a reactor, the said effluents being transported through at least one pump towards plasma means capable of destroying at least certain bonds in the molecules of the PFC or HFC type between the fluorine and the other elements of these molecules of the PFC or HFC type, in order to generate first species which are then converted to second gaseous, liquid or solid species before interaction of these second species with dry or wet purifying means. According to the invention, at least one reducing agent is injected upstream and/or downstream of the plasma, but upstream of the purifying means, in order to react with the first species created.

摘要翻译： 本发明涉及一种用于破坏从反应器排出的污水的方法，所述流出物通过至少一个泵输送到等离子体装置，所述等离子体装置能够在氟和其它元素之间破坏PFC或HFC型分子中的至少某些键 的PFC或HFC类型的这些分子，以便产生第一物质，然后在将这些第二物质与干或湿净化装置相互作用之前将其转化为第二气态，液体或固体物质。 根据本发明，至少一种还原剂被注入到等离子体的上游和/或下游，但在净化装置的上游，以便与所产生的第一种类物质反应。

公开(公告)号：US06183720B2

公开(公告)日：2001-02-06

申请号：US09056765

申请日：1998-04-08

申请人： Thierry Laederich ,  Hervé Dulphy

发明人： Thierry Laederich ,  Hervé Dulphy

IPC分类号： C01B707

CPC分类号： C01B7/195 ,  C01B7/0731 ,  C01C1/022 ,  C01P2006/80

摘要： A process for producing a high-purity liquid chemical is provided. A chemical gas is successively purified over first and second purification columns by passing, countercurrently, a scrubbing solution of initially deionized high-purity water through the first and second purification columns, or by passing, countercurrently, a first scrubbing solution of initially deionized high-purity water through the first column and a second scrubbing solution of initially deionized water through the second column. Each of the scrubbing solutions gradually becomes a spent scrubbing solution loaded with impurity. A high-purity chemical gas leaves the second purification column with a low content of metallic elements. The high-purity chemical gas is subsequently dissolved in a liquid in a dissolution column including a top and a bottom. The liquid at the bottom of the dissolution column is collected and continuously recirculated, and is enriched with purified chemical gas, thereby forming a high-purity liquid chemical. The high-purity liquid chemical is subsequently distributed when a desired concentration of dissolved gas has been reached.

摘要翻译： 提供了一种生产高纯度液体化学品的方法。 通过使第一和第二纯化塔逆流通过初始去离子高纯水的洗涤溶液，或通过逆流通过第一和第二纯化塔的初始去离子水的第一洗涤溶液， 通过第一塔的纯净水和初始去离子水通过第二塔的第二洗涤溶液。 每个洗涤溶液逐渐变成装有杂质的废擦洗溶液。 高纯度化学气体离开具有低含量金属元素的第二纯化塔。 随后将高纯度化学气体溶解在包括顶部和底部的溶解柱中的液体中。 将溶解塔底部的液体收集并连续循环，并用纯化学气体富集，从而形成高纯度液体化学品。 随后，当达到所需浓度的溶解气体时，高纯度液体化学品随后分布。

公开(公告)号：US08308146B2

公开(公告)日：2012-11-13

申请号：US13173027

申请日：2011-06-30

申请人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

发明人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

IPC分类号： B01F3/04

CPC分类号： B01D53/78 ,  B01D53/18 ,  B01D2258/0216

摘要： An apparatus and method for the treatment of gaseous effluents involving contact with a liquid may include a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, wherein the chamber allows a gas to be treated. The chamber may also release residual gases following treatment involving contact with the liquid. The apparatus may also include a turbine that includes one or more stages which ensure improved contact between the gas and the liquid, the upper part of the turbine being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, a sensor for measuring the pH of the liquid.

摘要翻译： 用于处理涉及与液体接触的气体流出物的装置和方法可以包括气体/液体接触室，其可以在其下部接收液体，并且顶盖有气体盖，其中所述室允许气体为 治疗。 室内还可以在涉及与液体接触的处理之后释放残余气体。 该装置还可以包括涡轮机，其包括一个或多个台阶，其确保气体和液体之间的改善的接触，涡轮的上部配备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的传感器。

公开(公告)号：US20110259196A1

公开(公告)日：2011-10-27

申请号：US13173027

申请日：2011-06-30

申请人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

发明人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

IPC分类号： B01D53/78 ,  B01F3/04 ,  B01D53/18

CPC分类号： B01D53/78 ,  B01D53/18 ,  B01D2258/0216

摘要： The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

摘要翻译： 本发明涉及一种用于处理气体流出物的装置，例如源于生产涉及与液体接触的半导体的那些。 本发明的装置包括：气/液接触室，其可以在其下部接收液体并且被顶盖有气体盖，所述室包括用于引入待处理气体的装置和用于在处理后释放残留气体的装置 涉及液体接触; 涡轮式气体/液体接触装置包括一个或多个级，其确保气体和液体之间的接触改善，所述装置的上部装备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的装置。

公开(公告)号：US08016271B2

公开(公告)日：2011-09-13

申请号：US10592336

申请日：2005-03-31

申请人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

发明人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

IPC分类号： B01F3/04

CPC分类号： B01D53/78 ,  B01D53/18 ,  B01D2258/0216

摘要： The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

摘要翻译： 本发明涉及一种用于处理气体流出物的装置，例如源于生产涉及与液体接触的半导体的那些。 本发明的装置包括：气/液接触室，其可以在其下部接收液体并且被顶盖有气体盖，所述室包括用于引入待处理气体的装置和用于在处理后释放残余气体的装置 涉及液体接触; 涡轮式气体/液体接触装置包括一个或多个级，其确保气体和液体之间的接触改善，所述装置的上部装备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的装置。

公开(公告)号：US20070205522A1

公开(公告)日：2007-09-06

申请号：US10592336

申请日：2005-03-31

申请人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

发明人： Hervé Dulphy ,  Pascal Moine ,  Thierry Laederich

IPC分类号： B01D47/02

CPC分类号： B01D53/78 ,  B01D53/18 ,  B01D2258/0216

摘要： The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

摘要翻译： 本发明涉及一种用于处理气体流出物的装置，例如源于生产涉及与液体接触的半导体的那些。 本发明的装置包括：气/液接触室，其可以在其下部接收液体并且被顶盖有气体盖，所述室包括用于引入待处理气体的装置和用于在处理后释放残余气体的装置 涉及液体接触; 涡轮式气体/液体接触装置包括一个或多个级，其确保气体和液体之间的接触改善，所述装置的上部装备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的装置。

公开(公告)号：US20050084979A1

公开(公告)日：2005-04-21

申请号：US10498256

申请日：2002-12-10

申请人： Hervé Dulphy ,  Christophe Martin

发明人： Hervé Dulphy ,  Christophe Martin

IPC分类号： G05D11/13 ,  G01N31/16

CPC分类号： G05D11/138

摘要： The invention concerns a system for regulating the titer of a solution, which consists in adding in the solution a predetermined amount of a product contained in the solution in a time interval, called addition time interval, proportional to the product of the time coefficient D of degradation of said product in solution and to the total volume Vt of the solution at the time of the addition. The invention also concerns a device for controlling the regulation of the titer of a solution, said solution containing a product, comprising means (10) for controlling injection of a predetermined amount of said product into said solution according to a time interval, called addition time interval, proportional to the product of the time coefficient D of degradation of said product and to the total volume Vt of the solution at the time of addition.

摘要翻译： 本发明涉及一种用于调节溶液滴度的系统，该系统包括在溶液中加入包含在溶液中的预定量的产品，该时间间隔称为加料时间间隔，该时间间隔与时间系数D的乘积成比例 所述产物在溶液中的降解和溶液加入时的总体积Vt。 本发明还涉及一种用于控制溶液滴度调节的装置，所述溶液含有一种产品，其包括用于根据时间间隔控制将预定量的所述产品注入所述溶液的装置（10），称为加料时间 间隔，与所述产物的降解时间系数D与添加时溶液的总体积Vt的乘积成比例。