公开(公告)号：US20180334744A1

公开(公告)日：2018-11-22

申请号：US16049199

申请日：2018-07-30

Applicant: Ceres Technologies, Inc.

Inventor： Egbert WOELK ,  Ronald L. DICARLO

IPC: C23C16/455 ,  C23C16/448 ,  C23C14/24 ,  C23C14/54 ,  C30B25/14 ,  C30B23/00 ,  C23C14/06 ,  C23C16/30

CPC classification number: C23C16/455 ,  C23C14/0617 ,  C23C14/0629 ,  C23C14/243 ,  C23C14/54 ,  C23C16/301 ,  C23C16/306 ,  C23C16/4482 ,  C30B23/00 ,  C30B25/14

Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.