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公开(公告)号：US10261424B2
公开(公告)日：2019-04-16
申请号：US15845590
申请日：2017-12-18
Applicant: Carl Zeiss SMT GmbH
Inventor： Udo Dinger , Markus Holz , Ulrich Bihr
Abstract: A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.
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2.发明授权公开(公告)号：US11262660B2
公开(公告)日：2022-03-01
申请号：US16987504
申请日：2020-08-07
Applicant: Carl Zeiss SMT GmbH
Inventor： Jan Horn , Ulrich Bihr , Andy Zott , Markus Deguenther
IPC: G03F7/20
Abstract: An image sensor for a position sensor apparatus for ascertaining a position of at least one mirror of a lithography apparatus includes: a plurality of integrated optical waveguides; a plurality of incoupling areas; a multiplexer apparatus; and an image reconstruction apparatus.
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公开(公告)号：US10139618B2
公开(公告)日：2018-11-27
申请号：US15701803
申请日：2017-09-12
Applicant: Carl Zeiss SMT GmbH
Inventor： Jan Horn , Stefan Tuerk , Oscar Noordman , Ulrich Bihr
IPC: G02B26/08 , G03F7/20 , H02K41/035 , H02K49/04
Abstract: A multi-mirror array including displaceable mirror elements includes a passive electric damping mechanism for damping disturbances of the displacement positions of the mirror elements.
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Patent Agency Ranking
公开(公告)号：US20180107122A1
公开(公告)日：2018-04-19
申请号：US15845590
申请日：2017-12-18
Applicant: Carl Zeiss SMT GmbH
Inventor： Udo Dinger , Markus Holz , Ulrich Bihr
IPC: G03F7/20
CPC classification number: G03F7/70575 , G02B26/0833 , G03F7/70033 , G03F7/70116 , G03F7/70258 , G03F7/7085
Abstract: A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.
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公开(公告)号：US10514619B2
公开(公告)日：2019-12-24
申请号：US15878041
申请日：2018-01-23
Applicant: Carl Zeiss SMT GmbH
Inventor： Ulrich Bihr , Markus Holz , Jan Horn
Abstract: The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.
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公开(公告)号：US20190259575A1
公开(公告)日：2019-08-22
申请号：US16277572
申请日：2019-02-15
Applicant: Carl Zeiss Microscopy GmbH , Carl Zeiss SMT GmbH
Inventor： Yanko Sarov , Jan Horn , Ulrich Bihr , Christof Riedesel , Erik Essers
IPC: H01J37/317 , H01J37/24 , H01J37/34 , H01J37/305
Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.
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7.发明申请公开(公告)号：US20180188656A1
公开(公告)日：2018-07-05
申请号：US15878041
申请日：2018-01-23
Applicant: Carl Zeiss SMT GmbH
Inventor： Ulrich Bihr , Markus Holz , Jan Horn
Abstract: The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.
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公开(公告)号：US20180003951A1
公开(公告)日：2018-01-04
申请号：US15701803
申请日：2017-09-12
Applicant: Carl Zeiss SMT GmbH
Inventor： Jan Horn , Stefan Tuerk , Oscar Noordman , Ulrich Bihr
IPC: G02B26/08 , G03F7/20 , H02K41/035 , H02K49/04
CPC classification number: G02B26/0833 , G02B26/0841 , G03F7/702 , H02K41/035 , H02K49/04
Abstract: A multi-mirror array including displaceable mirror elements includes a passive electric damping mechanism for damping disturbances of the displacement positions of the mirror elements.
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