Polishing pad for polishing semiconductor surfaces
    2.
    发明授权
    Polishing pad for polishing semiconductor surfaces 有权
    用于抛光半导体表面的抛光垫

    公开(公告)号:US09004983B2

    公开(公告)日:2015-04-14

    申请号:US13955683

    申请日:2013-07-31

    Abstract: Methods and apparatus for forming a semi-spherical polishing pad for polishing semiconductor surfaces, provide for: placing a polishing pad pre-form on a dome-shaped forming surface, the polishing pad pre-form including a circular body having a center and an outer peripheral edge, and a plurality of slots extending from the outer peripheral edge towards the center; disposing a bladder opposite to the dome-shaped forming surface and the polishing pad pre-form; inflating the bladder with a fluid such that the dome-shaped forming surface of the bonnet form presses against the polishing pad pre-form from one side and the bladder presses against the polishing pad pre-form from an opposite side; and maintaining the pressing step for a predetermined period of time to achieve the semi-spherical polishing pad.

    Abstract translation: 用于形成用于抛光半导体表面的半球形抛光垫的方法和装置提供:将抛光垫预成型放置在圆顶形成形表面上,所述抛光垫预成型件包括具有中心和外部的圆形主体 周缘,以及从外周缘向中心延伸的多个槽; 设置与圆顶形状表面相对的囊和抛光垫预成型件; 用流体使气囊膨胀,使得发动机罩形状的圆顶形成表面从一侧挤压抛光垫预成型件,并且气囊从相对侧压靠抛光垫预成型件; 并且保持按压步骤达预定时间以实现半球形抛光垫。

    METHODS FOR PROCESSING A SUBSTRATE
    4.
    发明申请

    公开(公告)号:US20190275782A1

    公开(公告)日:2019-09-12

    申请号:US16349845

    申请日:2017-11-13

    Abstract: A method of processing a substrate, with a first major surface of the substrate removably bonded to a first major surface of a first carrier and a second major surface of the substrate removably bonded to a first major surface of a second carrier, includes initiating debonding at a first location of an outer peripheral bonded interface between the substrate and the first carrier to separate a portion of the first carrier from the substrate. The method further includes propagating a first debond front from the first debonded location along a first direction extending away from the first debonded location by sequentially applying a plurality of lifting forces to the first carrier at a corresponding plurality of sequential lifting locations of the first carrier.

    METHOD AND APPARATUS FOR FORMING A SLURRY POLISHING PAD
    6.
    发明申请
    METHOD AND APPARATUS FOR FORMING A SLURRY POLISHING PAD 审中-公开
    用于形成浆状抛光垫的方法和装置

    公开(公告)号:US20130316631A1

    公开(公告)日:2013-11-28

    申请号:US13955683

    申请日:2013-07-31

    Abstract: Methods and apparatus for forming a semi-spherical polishing pad for polishing semiconductor surfaces, provide for: placing a polishing pad pre-form on a dome-shaped forming surface, the polishing pad pre-form including a circular body having a center and an outer peripheral edge, and a plurality of slots extending from the outer peripheral edge towards the center; disposing a bladder opposite to the dome-shaped forming surface and the polishing pad pre-form; inflating the bladder with a fluid such that the dome-shaped forming surface of the bonnet form presses against the polishing pad pre-form from one side and the bladder presses against the polishing pad pre-form from an opposite side; and maintaining the pressing step for a predetermined period of time to achieve the semi-spherical polishing pad.

    Abstract translation: 用于形成用于抛光半导体表面的半球形抛光垫的方法和装置提供:将抛光垫预成型放置在圆顶形成形表面上,所述抛光垫预成型件包括具有中心和外部的圆形主体 周缘,以及从外周缘向中心延伸的多个槽; 设置与圆顶形状表面相对的囊和抛光垫预成型件; 用流体使气囊膨胀,使得发动机罩形状的圆顶形成表面从一侧挤压抛光垫预成型件,并且气囊从相对侧压靠抛光垫预成型件; 并且保持按压步骤达预定时间以实现半球形抛光垫。

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