SEPARATE MICROSCOPY SYSTEM AND ADJUSTING METHOD THEREOF

    公开(公告)号:US20200209603A1

    公开(公告)日:2020-07-02

    申请号:US16719386

    申请日:2019-12-18

    Abstract: A separate microscopy system, applied to observe a specimen positioned on a stage and further to image the specimen on an imaging device, includes an ocular-lens unit, an adjustment unit and an objective-lens unit. The ocular-lens unit has an ocular-lens optical axis, and is manipulated to make the ocular-lens optical axis perpendicular to the stage. The adjustment unit is assembled to a side of the ocular-lens unit close to the stage. The objective-lens unit has an objective-lens optical axis, and is assembled to a side of the adjustment unit close to the stage. The objective-lens unit is manipulated to be adjusted by the adjustment unit to make the ocular-lens optical axis, the objective-lens optical axis and the imaging device co-axially and perpendicular to the stage, such that the specimen can be imaged at an imaging center position of the imaging device. In addition, an adjusting method thereof is also provided.

    DETECTION DEVICE
    2.
    发明申请
    DETECTION DEVICE 审中-公开

    公开(公告)号:US20190257762A1

    公开(公告)日:2019-08-22

    申请号:US16256578

    申请日:2019-01-24

    Abstract: A detection device, applied to detect an object under test, includes a beam splitter, a pattern beam generator, an image-capturing device and a processor. The pattern beam generator and the image-capturing device are located to two different sides of the beam splitter in a conjugate arrangement. The pattern beam generator is to generate a preset pattern, and the preset pattern is then projected onto the object under test via the beam splitter. The image-capturing device is to capture a real pattern via the beam splitter, in which the real pattern is generated on the object under test after the preset pattern is projected onto the object under test. The processor is to compare the preset pattern and the real pattern and to further determine a quality of the object under test.

    SURFACE MEASUREMENT SYSTEM
    3.
    发明申请

    公开(公告)号:US20190145762A1

    公开(公告)日:2019-05-16

    申请号:US16190112

    申请日:2018-11-13

    CPC classification number: G01B11/303 G01N21/51 G01N21/958 G01N2021/4735

    Abstract: A surface measurement system is configured to measure a sample with a low reflectivity surface. The surface measurement system includes a condensation device and a measurement device. The condensation device is configured to form a liquid layer on the surface of the sample. The condensation device includes a chamber, a temperature controlling gas source, and a humidification gas source. The chamber is configured to accommodate the sample. The temperature controlling gas source is connected to the chamber to provide temperature controlling gases to the chamber, so as to control the temperature of the sample. The humidification gas source is connected to the chamber to provide water vapor to the chamber, so as to form the liquid layer on the surface of the sample. The measurement device includes a plate, a light source, and an image capturing device.

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