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公开(公告)号：US09725389B2
公开(公告)日：2017-08-08
申请号：US14364829
申请日：2012-11-29
发明人： Yun-Jun Kim , Hwan-Sung Cheon , Youn-Jin Cho , Yong-Woon Yoon , Chung-Heon Lee , Hyo-Young Kwon , Yoo-Jeong Choi
IPC分类号： C07C39/21 , C07C39/205 , C07C33/26 , G03F7/039 , G03F7/11 , H01L21/027 , C07C39/225 , G03F1/00 , G03F7/09 , G03F7/20 , H01L21/02 , H01L21/033 , H01L21/311
CPC分类号： C07C39/21 , C07C39/225 , C08G65/38 , G03F1/00 , G03F7/094 , G03F7/20 , H01L21/02118 , H01L21/02282 , H01L21/0332 , H01L21/31144
摘要： Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A′, L and n are the same as in the detailed description.
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2.发明申请MONOMER, HARD MASK COMPOSITION COMPRISING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARD MASK COMPOSITION 有权包含单体的单体，硬掩模组合物和使用合适的硬掩模组合物形成图案的方法公开(公告)号：US20150301448A1
公开(公告)日：2015-10-22
申请号：US14441294
申请日：2013-03-19
发明人： You-Jung Park , Hea-Jung Kim , Yo-Choul Park , Yong-Woon Yoon , Sung-Jae Lee , Chul-Ho Lee , Youn-Jin Cho
IPC分类号： G03F7/027 , C07C49/835 , C07C49/796
CPC分类号： G03F7/027 , C07C49/788 , C07C49/792 , C07C49/796 , C07C49/798 , C07C49/83 , C07C49/835 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/16 , G03F7/30 , G03F7/36
摘要： Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
摘要翻译： 公开了由化学式1表示的硬掩模组合物的单体，包含单体的硬掩模组合物以及使用其形成图案的方法。
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3.发明授权Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition 有权包含所述单体的单体，硬掩模组合物和使用所述硬掩模组合物形成图案的方法公开(公告)号：US09513546B2
公开(公告)日：2016-12-06
申请号：US14441294
申请日：2013-03-19
发明人： You-Jung Park , Hea-Jung Kim , Yo-Choul Park , Yong-Woon Yoon , Sung-Jae Lee , Chul-Ho Lee , Youn-Jin Cho
IPC分类号： G03F7/027 , G03F7/16 , G03F7/11 , G03F7/30 , G03F7/36 , G03F7/09 , C07C49/83 , C07C49/798 , C07C49/788 , C07C49/796 , C07C49/835 , C07C49/792
CPC分类号： G03F7/027 , C07C49/788 , C07C49/792 , C07C49/796 , C07C49/798 , C07C49/83 , C07C49/835 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/16 , G03F7/30 , G03F7/36
摘要： Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
摘要翻译： 公开了由化学式1表示的硬掩模组合物的单体，包含单体的硬掩模组合物以及使用其形成图案的方法。
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4.发明申请MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION 有权用于HARDMASK组合物的单体，包含单体的HARDMASK组合物和使用HARDMASK组合物形成图案的方法公开(公告)号：US20140342273A1
公开(公告)日：2014-11-20
申请号：US14364829
申请日：2012-11-29
发明人： Yun-Jun Kim , Hwan-Sung Cheon , Youn-Jin Cho , Yong-Woon Yoon , Chung-Heon Lee , Hyo-Young Kwon , Yoo-Jeong Choi
IPC分类号： C07C39/21 , G03F7/20 , C07C39/225 , G03F1/00
CPC分类号： C07C39/21 , C07C39/225 , C08G65/38 , G03F1/00 , G03F7/094 , G03F7/20 , H01L21/02118 , H01L21/02282 , H01L21/0332 , H01L21/31144
摘要： Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A′, L and n are the same as in the detailed description.
摘要翻译： 公开了由以下化学式1表示的硬掩模组合物的单体，包含该单体的硬掩模组合物，以及使用其形成图案的方法。 在化学式1中，A，A'，L和n与详细说明中相同。
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公开(公告)号：US09823566B2
公开(公告)日：2017-11-21
申请号：US14764869
申请日：2013-05-08
发明人： Yong-Woon Yoon , Sung-Jae Lee , Joon-Young Moon , You-Jung Park , Chul-Ho Lee , Youn-Jin Cho
IPC分类号： G03F7/11 , C07D303/32 , C09D163/00 , G03F7/20 , G03F7/32 , C07D303/14 , C09D5/00 , C09D7/12 , G03F7/34
CPC分类号： G03F7/11 , C07D303/14 , C07D303/32 , C09D5/00 , C09D7/63 , C09D163/00 , G03F7/20 , G03F7/32 , G03F7/34
摘要： Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A, A′ , X, Y, I, m and n are the same as described in the detailed description.
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公开(公告)号：US09529257B2
公开(公告)日：2016-12-27
申请号：US14420957
申请日：2013-09-02
发明人： Chul-Ho Lee , You-Jung Park , Yong-Woon Yoon , Sung-Jae Lee , Youn-Jin Cho , Young-Min Kim , Chung-Heon Lee
CPC分类号： G03F7/004 , G03F7/0035 , G03F7/094
摘要： Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
摘要翻译： 公开了由化学式1表示的聚合物，由化学式2表示的单体和溶剂，其中所述单体包含在与聚合物相同或更高的量中，以及使用其形成图案的方法。
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公开(公告)号：US20150205198A1
公开(公告)日：2015-07-23
申请号：US14420957
申请日：2013-09-02
发明人： Chul-Ho Lee , You-Jung Park , Yong-Woon Yoon , Sung-Jae Lee , Youn-Jin Cho , Young-Min Kim , Chung-Heon Lee
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , G03F7/0035 , G03F7/094
摘要： Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
摘要翻译： 公开了由化学式1表示的聚合物，由化学式2表示的单体和溶剂，其中所述单体包含在与聚合物相同或更高的量中，以及使用其形成图案的方法。
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