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    Optical system, and method
    2.
    发明授权
    Optical system, and method 有权

    公开(公告)号：US10852643B2

    公开(公告)日：2020-12-01

    申请号：US16578691

    申请日：2019-09-23

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Dirk Juergens ,  Kerstin Hild ,  Bernd Geh

    IPC: G03F7/20 ,  G02B26/08

    Abstract: An optical system for a lithography machine includes: a main mirror element and a manipulator device for positioning and/or orienting said main mirror element. The optical system also includes an optically active surface for reflecting radiation. The optical system further includes an actuator matrix positioned between the main mirror element and the optically active surface. The actuator matrix is configured to deform the optically active surface to influence the reflective properties of the optically active surface. A gap is present between the actuator matrix and a front side of the main mirror element so that the actuator matrix is spaced apart from the main mirror element.

    OPTICAL SYSTEM, AND METHOD
    5.
    发明申请
    OPTICAL SYSTEM, AND METHOD 审中-公开

    公开(公告)号：US20200073252A1

    公开(公告)日：2020-03-05

    申请号：US16578691

    申请日：2019-09-23

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Dirk Juergens ,  Kerstin Hild ,  Bernd Geh

    IPC: G03F7/20

    Abstract: An optical system for a lithography machine includes: a main mirror element and a manipulator device for positioning and/or orienting said main mirror element. The optical system also includes an optically active surface for reflecting radiation. The optical system further includes an actuator matrix positioned between the main mirror element and the optically active surface. The actuator matrix is configured to deform the optically active surface to influence the reflective properties of the optically active surface. A gap is present between the actuator matrix and a front side of the main mirror element so that the actuator matrix is spaced apart from the main mirror element.

    Projection objective for microlithography
    6.
    发明授权
    Projection objective for microlithography 有权
    微光刻的投影目标

    公开(公告)号：US09568838B2

    公开(公告)日：2017-02-14

    申请号：US14967448

    申请日：2015-12-14

    Applicant: CARL ZEISS SMT GmbH

    Inventor： Bernd Geh

    IPC: G03B27/42 ,  G03F7/20

    CPC classification number: G03F7/702 ,  G03F7/703 ,  G03F7/70783

    Abstract: A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which are arranged along an optical axis of the projection objective and are configured in such a way that a defined image field curvature of the projection objective is set in such a way that an object surface that is curved convexly with respect to the projection objective can be imaged into a planar image surface. What can be achieved given a suitable setting of the object surface curvature is that a gravitation-dictated bending of a mask does not have a disturbing effect on the imaging quality.

    Abstract translation: 用于将布置在投影物体的物体表面中的图案成像成具有缩小成像刻度的投影物镜的图像表面的投影物镜具有沿着投影物镜的光轴布置的多个光学元件， 使得投影物镜的定义的图像场曲率被设置为使得相对于投影物体凸出地弯曲的物体表面可以被成像为平面图像表面的方式。 给定对象表面曲率的适当设置可以实现什么是掩模的重力指定弯曲对成像质量没有干扰的影响。

    METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER
    7.
    发明申请
    METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER 审中-公开
    用于产生光学元件和/或波形的预定三维轮廓的方法和装置

    公开(公告)号：US20170010540A1

    公开(公告)日：2017-01-12

    申请号：US15272936

    申请日：2016-09-22

    Applicant: Carl Zeiss SMS Ltd. ,  Carl Zeiss SMT GmbH

    Inventor： Vladimir Dmitriev ,  Bernd Geh

    IPC: G03F7/20

    CPC classification number: G03F7/70283 ,  B82Y40/00 ,  G03F1/60 ,  G03F1/72 ,  G03F7/0002 ,  G03F7/70316 ,  G03F7/70591 ,  G21K1/062 ,  H01L22/12 ,  H01L22/20

    Abstract: A method for generating a predetermined three-dimensional contour of a component and/or a wafer comprises: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.

    Abstract translation: 用于产生部件和/或晶片的预定三维轮廓的方法包括：（a）确定部件和/或晶片的现有三维轮廓与预定三维轮廓的偏差; （b）计算具有一个或多个限定激光脉冲的参数集的激光脉冲的至少一个立体布置，用于将所确定的三维轮廓的现有偏差与预定的三维轮廓进行校正; 和（c）将所计算的激光脉冲的至少一个三维布置应用于所述部件和/或所述晶片以产生所述预定的三维轮廓。

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