Invention Grant
- Patent Title: Projection objective for microlithography
- Patent Title (中): 微光刻的投影目标
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Application No.: US14967448Application Date: 2015-12-14
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Publication No.: US09568838B2Publication Date: 2017-02-14
- Inventor: Bernd Geh
- Applicant: CARL ZEISS SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Edell, Shapiro & Finnan, LLC
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20

Abstract:
A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which are arranged along an optical axis of the projection objective and are configured in such a way that a defined image field curvature of the projection objective is set in such a way that an object surface that is curved convexly with respect to the projection objective can be imaged into a planar image surface. What can be achieved given a suitable setting of the object surface curvature is that a gravitation-dictated bending of a mask does not have a disturbing effect on the imaging quality.
Public/Granted literature
- US20160170307A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY Public/Granted day:2016-06-16
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