System and method for bit-wise selective masking of scan vectors for X-value tolerant built-in self test
    3.
    发明授权
    System and method for bit-wise selective masking of scan vectors for X-value tolerant built-in self test 有权
    用于X值容忍内置自检的扫描向量的逐位选择性屏蔽的系统和方法

    公开(公告)号:US09448282B1

    公开(公告)日:2016-09-20

    申请号:US14179299

    申请日:2014-02-12

    Abstract: A system and method are provided for selective bit-wise masking of X-values in scan channels in an integrated circuit (IC) during a built-in self test (BIST). The composite mask pattern is selectively generated according to locations of X-values identified in a simulation of the IC. The composite mask pattern is stored on the IC and cyclically maintained while being applied to the operational scan results of the IC. The composite mask pattern is recycled over a plurality of scan iterations to effectively prevent the X-values from influencing the resulting signature of the BIST that represents a functional fingerprint of the IC and minimize storage requirements for the composite mask pattern.

    Abstract translation: 提供了一种系统和方法,用于在内置自检(BIST)期间在集成电路(IC)的扫描通道中对X值进行选择性逐位屏蔽。 根据在IC的仿真中识别的X值的位置选择性地生成复合掩模图案。 复合掩模图案被存储在IC上并在被应用于IC的操作扫描结果的同时循环地保持。 复合掩模图案在多个扫描迭代中被再循环,以有效地防止X值影响表示IC的功能指纹的BIST的结果签名,并且最小化复合掩模图案的存储要求。

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