公开(公告)号：US12261407B2

公开(公告)日：2025-03-25

申请号：US17389400

申请日：2021-07-30

Applicant: BEIJING RSLASER OPTO-ELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Zebin Feng ,  Xiaoquan Han ,  Rui Jiang ,  Junhong Yang ,  Hua Zhang ,  Qin Zhang ,  Xiang Wang ,  Mi Liao

IPC: H01S3/134 ,  H01S3/13 ,  H01S3/225

Abstract: A control method for stabilizing excimer laser pulse energy includes: obtaining a measured energy value of the n-th pulse in a pulse sequence; calculating the difference between the measured energy value and the preset energy value; taking the z-th pulse of the sequence as a demarcation point, when n is a positive integer less than z, the discharge voltage value of the next pulse is calculated according to a first mathematical model, and when n is an integer greater than z−1, the discharge voltage value of the next pulse is calculated according to a second mathematical model; and the next pulse is generated according to the discharge voltage value. A control system based on the control method includes: a high-voltage discharge module, a laser cavity, a laser parameter measurement module, and an energy stability controller.

公开(公告)号：US11971307B2

公开(公告)日：2024-04-30

申请号：US17915434

申请日：2020-12-11

Applicant: Beijing RSLaser Opto-Electronics Technology Co., Ltd.

Inventor： Guangyi Liu ,  Rui Jiang ,  Xiaoquan Han ,  Jiangshan Zhao ,  Pengfei Sha ,  Qingqing Yin ,  Hua Zhang

IPC: G01J9/02

CPC classification number: G01J9/0246 ,  G01J2009/0234 ,  G01J2009/0257

Abstract: According to the present disclosure, there is provided a device (2) and a method for measuring a wavelength for a laser device. The device (2) for measuring a wavelength for a laser device includes: a first optical path assembly and a second optical path assembly. The first optical path assembly and the second optical path assembly constitute a laser wavelength measurement optical path. The second optical path assembly includes: an FP etalon assembly (11) and an optical classifier (13). The homogenized laser beam passes through the FP etalon assembly (11) to generate an interference fringe. The optical classifier (13) is arranged after the FP etalon assembly (11) in the laser wavelength measurement optical path, and configured to deflect the laser beam passing through the FP etalon assembly (11).

公开(公告)号：US20210359487A1

公开(公告)日：2021-11-18

申请号：US17389400

申请日：2021-07-30

Applicant: Beijing Rslaser Opto-Electronics Technology Co., Ltd.

Inventor： Zebin Feng ,  Xiaoquan Han ,  Rui Jiang ,  Junhong Yang ,  Hua Zhang ,  Qin Zhang ,  Xiang Wang ,  Mi Liao

IPC: H01S3/13 ,  H01S3/11

Abstract: A control method for stabilizing excimer laser pulse energy includes: obtaining a measured energy value of the n-th pulse in a pulse sequence; calculating the difference between the measured energy value and the preset energy value; taking the z-th pulse of the sequence as a demarcation point, when n is a positive integer less than z, the discharge voltage value of the next pulse is calculated according to a first mathematical model, and when n is an integer greater than z−1, the discharge voltage value of the next pulse is calculated according to a second mathematical model; and the next pulse is generated according to the discharge voltage value. A control system based on the control method includes: a high-voltage discharge module, a laser cavity, a laser parameter measurement module, and an energy stability controller.

公开(公告)号：US12287241B2

公开(公告)日：2025-04-29

申请号：US17915388

申请日：2020-12-16

Applicant: Beijing RSLaser Opto-Electronics Technology Co., Ltd.

Inventor： Guangyi Liu ,  Rui Jiang ,  Xiaoquan Han ,  Jiangshan Zhao ,  Pengfei Sha ,  Qingqing Yin ,  Hua Zhang ,  Xinyue Hu

IPC: G01J3/45 ,  G01J3/02

Abstract: Provided are a device (4) and a method for online measuring a spectrum for a laser device. The device (4) for online measuring a spectrum for a laser device includes: a first optical path assembly (G1) and a second optical path assembly (G2), and the second optical path assembly (G2) and the first optical path assembly (G1) constitute a measurement optical path. The second optical path assembly (G2) includes: an FP etalon (15) and a grating (18). The homogenized laser beam passes through the FP etalon (15) to generate an interference fringe. The grating (18) is arranged after the FP etalon (15), or is arranged before the FP etalon (15) in the measurement optical path, and is configured to disperse the laser beam passing through the FP etalon (15).