公开(公告)号：US10916565B2

公开(公告)日：2021-02-09

申请号：US16330922

申请日：2018-05-15

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Haixu Li ,  Zhanfeng Cao ,  Qi Yao ,  Dapeng Xue ,  Da Lu

IPC: H01L21/00 ,  H01L27/12 ,  H01L29/786 ,  H01L29/66

Abstract: The present disclosure provides a field of display technologies, and in particular, to a LTPS substrate and a fabricating method thereof, a thin film transistor thereof, an array substrate thereof, and a display device thereof. The LTPS substrate, able to be used for the fabrication of a thin film transistor, includes a light shielding layer, the light shielding layer mainly composed of amorphous silicon doped with a lanthanide element. The present disclosure mainly employs an amorphous silicon film layer doped with the lanthanide element as the light shielding layer of the LTPS substrate, which not only ensures the light shielding efficiency but also reduces the production process, and further prevents the occurrence of the H explosion problem due to H exuding during the ELA process.

公开(公告)号：US20200326569A1

公开(公告)日：2020-10-15

申请号：US16097764

申请日：2018-03-30

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Haixu Li ,  Zhanfeng Cao ,  Qi Yao ,  Jianguo Wang ,  Da Lu ,  Shuilang Dong ,  Qingzhao Liu ,  Shengguang Ban

IPC: G02F1/1368 ,  G02F1/1362 ,  H01L27/12

Abstract: An array substrate, a method for manufacturing the same, a display panel, and a display device are provided. The array substrate comprises a substrate, a light shielding layer on the substrate, and a transistor arranged at a side of the light shielding layer away from the substrate, the transistor including an active layer.

公开(公告)号：US20200174172A1

公开(公告)日：2020-06-04

申请号：US16640195

申请日：2019-05-09

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuilang Dong ,  Da Lu ,  Qingzhao Liu ,  Guoqiang Wang ,  Zhanfeng Cao ,  Jiushi Wang

IPC: G02B5/30 ,  G02B1/113

Abstract: The present disclosure provides a polarizing device and a method for preparing the same, a display substrate, and a display device. The polarizing device includes: a base substrate, a metal wire grid, and an anti-reflection layer, in which the metal wire grid is arranged on the base substrate, the anti-reflection layer is arranged on the surface of the metal wire grid away from the base substrate, and the anti-reflection layer is a carbon film layer.

公开(公告)号：US10923512B2

公开(公告)日：2021-02-16

申请号：US15956465

申请日：2018-04-18

Applicant: BOE Technology Group Co., Ltd.

Inventor： Qingzhao Liu ,  Jiushi Wang ,  Da Lu

IPC: H01L27/12 ,  H01L29/40 ,  H01L21/3215 ,  H01L27/092 ,  H01L29/06 ,  H01L29/423

Abstract: The embodiments of the present disclosure provide an array substrate, a preparation method thereof, and a display device. The preparation method of an array substrate comprises: forming the active layer, a gate insulating layer, the gate metal layer and the patterned photoresist sequentially on a substrate; forming a gate electrode transition pattern by etching a gate metal layer via a patterned photoresist, using a wet etching process and a dry etching process sequentially; and doping an area of the active layer not sheltered by the gate electrode transition pattern with ions to form a heavily doped area of the active layer.

公开(公告)号：US20190051677A1

公开(公告)日：2019-02-14

申请号：US15956465

申请日：2018-04-18

Applicant: BOE Technology Group Co., Ltd.

Inventor： Qingzhao Liu ,  Jiushi Wang ,  Da Lu

IPC: H01L27/12 ,  H01L29/40 ,  H01L29/423 ,  H01L27/092 ,  H01L29/06 ,  H01L21/3215

Abstract: The embodiments of the present disclosure provide an array substrate, a preparation method thereof, and a display device. The preparation method of an array substrate comprises: forming the active layer, a gate insulating layer, the gate metal layer and the patterned photoresist sequentially on a substrate; forming a gate electrode transition pattern by etching a gate metal layer via a patterned photoresist, using a wet etching process and a dry etching process sequentially; and doping an area of the active layer not sheltered by the gate electrode transition pattern with ions to form a heavily doped area of the active layer.

公开(公告)号：US11619773B2

公开(公告)日：2023-04-04

申请号：US16485810

申请日：2019-01-24

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuilang Dong ,  Xin Gu ,  Kang Guo ,  Da Lu ,  Qingzhao Liu ,  Lei Zhao

IPC: C23F1/12 ,  G02B5/30 ,  G03F7/00 ,  G03F7/16 ,  G03F7/42

Abstract: A method of manufacturing a metal wire, a method of manufacturing a metal wire grid, a wire grid polarizer, and an electronic device are provided. The method of manufacturing a metal wire includes: forming a metal material layer on a base substrate; etching the metal material layer by using a composite gas including an etching gas and a coating reaction gas to form the metal wire and a protective coating layer on a surface of the metal wire.

公开(公告)号：US11520094B2

公开(公告)日：2022-12-06

申请号：US16640195

申请日：2019-05-09

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuilang Dong ,  Da Lu ,  Qingzhao Liu ,  Guoqiang Wang ,  Zhanfeng Cao ,  Jiushi Wang

IPC: G02B5/30 ,  G02B1/111 ,  G02B1/113

Abstract: The present disclosure provides a polarizing device and a method for preparing the same, a display substrate, and a display device. The polarizing device includes: a base substrate, a metal wire grid, and an anti-reflection layer, in which the metal wire grid is arranged on the base substrate, the anti-reflection layer is arranged on the surface of the metal wire grid away from the base substrate, and the anti-reflection layer is a carbon film layer.