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公开(公告)号：US20170114446A1
公开(公告)日：2017-04-27
申请号：US14938335
申请日：2015-11-11
发明人： Yujie YANG
IPC分类号： C23C14/35 , H01L21/285 , H01J37/34 , C23C14/06 , C23C14/34
CPC分类号： C23C14/35 , C23C14/0641 , C23C14/3414 , H01J37/3405 , H01J37/3408 , H01J37/3429 , H01J37/3452 , H01J37/347 , H01L21/2855
摘要： Some embodiments of the present disclosure provide a sputtering apparatus including a magnetron structure configured to erode a target according to a predetermined erosion rate profile symmetric to a central axis of the magnetron structure. The predetermined erosion rate profile includes a first peak rate in proximity to the central axis; and a second peak rate located at about from 0.7 to 0.75 of a radius of the target from the central axis.
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公开(公告)号：US20170011894A1
公开(公告)日：2017-01-12
申请号：US15113760
申请日：2014-12-31
发明人： Yujie YANG , Qiang LI , Guoqing QIU , Zhimin BAI , Hougong WANG , Peijun DING , Feng LV
CPC分类号： H01J37/3405 , C23C14/0641 , C23C14/14 , C23C14/3414 , C23C14/35 , H01J25/58 , H01J37/3408 , H01J37/3452
摘要： Embodiments of the invention provide a magnetron and a magnetron sputtering device, including an inner magnetic pole and an outer magnetic pole with opposite polarities. Both the inner magnetic pole and the outer magnetic pole comprise multiple spirals. The spirals of the outer magnetic pole surround the spirals of the inner magnetic pole, and a gap therebetween. In addition, the gap has different widths in different locations from a spiral center to an edge. Moreover, both the spirals of the outer magnetic pole and the spirals of the inner magnetic pole follow a polar equation: r=aθn+b(cos θ)m+c(tan θ)k+d, 0
摘要翻译： 本发明的实施例提供一种磁控管和磁控溅射装置，其包括具有相反极性的内磁极和外磁极。 内磁极和外磁极都包括多个螺旋。 外磁极的螺旋包围着内磁极的螺旋线和它们之间的间隙。 另外，间隙在从螺旋中心到边缘的不同位置具有不同的宽度。 此外，外磁极的螺旋和内磁极的螺旋都遵循极性方程：r =aθn+ b（cosθ）m + c（tanθ）k + d，0 <= n <= 2 ，0 <= m <= 2，c = 0或k = 0。 由于内磁极和外磁极之间的间隙在螺旋离散方向上具有不同的宽度，所以可以改变不同位置的间隙的宽度尺寸以控制平面中的磁场强度分布，从而调节 膜厚度。
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