公开(公告)号：US20160322206A1

公开(公告)日：2016-11-03

申请号：US15109050

申请日：2014-12-29

申请人： BEIJING NMC CO., LTD.

发明人： Feng LV ,  Fenggang ZHANG ,  Mengxin ZHAO ,  Peijun DING

IPC分类号： H01J37/32 ,  C23C14/00 ,  H01J37/34 ,  H01L21/67

CPC分类号： H01J37/32642 ,  C23C14/0068 ,  C23C14/34 ,  C23C14/564 ,  H01J37/32449 ,  H01J37/32633 ,  H01J37/32733 ,  H01J37/32853 ,  H01J37/34 ,  H01J37/3411 ,  H01L21/67167 ,  H01L21/6719 ,  H01L21/67207

摘要： Embodiments of the invention provide a process chamber and a semiconductor processing apparatus. According to at least one embodiment, the process chamber includes a reaction compartment, a gas introducing system and a wafer transfer device. The reaction compartment is provided in the process chamber and used for performing a process on a wafer, the gas introducing system is used for providing processing gas to the reaction compartment, and the wafer transfer device is used for transferring the wafer into the reaction compartment. A lining ring assembly is provided in the reaction compartment, and is configured such that a flow uniformizing cavity is formed between the lining ring assembly itself and an inner side wall of the reaction compartment, so as to uniformly transport the processing gas, from the gas introducing system, into the reaction compartment through the flow uniformizing cavity.

摘要翻译： 本发明的实施例提供一种处理室和半导体处理装置。 根据至少一个实施例，处理室包括反应室，气体引入系统和晶片转移装置。 反应室设置在处理室中，用于在晶片上进行处理，气体导入系统用于向反应室提供处理气体，并且晶片转移装置用于将晶片转移到反应室中。 衬套环组件设置在反应室中，并且构造成使得在衬套环组件本身和反应室的内侧壁之间形成流动均匀化空腔，从而均匀地输送来自气体的处理气体 引入系统，通过流动均匀化腔进入反应室。

公开(公告)号：US20160329228A1

公开(公告)日：2016-11-10

申请号：US15108493

申请日：2014-11-27

申请人： BEIJING NMC CO. LTD.

发明人： Meng LI ,  Fenggang ZHANG ,  Peijun DING ,  Mengxin ZHAO ,  Feifei LIU ,  Wen ZHANG

IPC分类号： H01L21/677

CPC分类号： H01L21/67778 ,  H01L21/67775 ,  H01L21/67796

摘要： The present invention provides a cassette positioning device and a semiconductor processing apparatus. The cassette positioning device includes: a positioning baseplate arranged horizontally and connected with the lifting device; a rotatable positioning, plate, which is located on the positioning baseplate, has one end rotatably connected with one end of the positioning baseplate, and is provided thereon with a positioning assembly; and a support column arranged under the rotatable positioning plate. The support column and the positioning baseplate can move relatively in the vertical direction, such that the rotatable positioning plate is pushed up by the support column and rotates to be inclined relatively to the positioning baseplate when the support column rises to a preset highest position relatively to the positioning baseplate, and the rotatable positioning plate and the positioning baseplate are stacked on the support column in parallel when the support column is located at a preset lowest position. In the cassette positioning device and the semiconductor processing apparatus, positions, in horizontal direction, of all the wafers in the cassette can be consistent, so that the wafers taken out by the mechanical arm can be located at uniquely specified positions on the mechanical arm.

摘要翻译： 本发明提供一种盒式定位装置和半导体处理装置。 盒定位装置包括：水平布置并与提升装置连接的定位底板; 位于定位基板上的可旋转定位板具有与定位基板的一端可旋转地连接的一端，并在其上设置有定位组件; 以及布置在可旋转定位板下方的支撑柱。 支撑柱和定位基板可以在垂直方向上相对移动，使得可旋转的定位板被支撑柱向上推动并且当支撑柱升高到相对于位置的预设最高位置时，相对于定位基板旋转以相对于定位基板倾斜 当支撑柱位于预设的最低位置时，定位基板以及可旋转定位板和定位基板平行堆叠在支撑柱上。 在盒式磁带定位装置和半导体处理装置中，磁带盒中的所有晶片在水平方向上的位置可以一致，使得由机械臂取出的晶片可以位于机械臂上唯一指定的位置。