公开(公告)号：US20180096875A1

公开(公告)日：2018-04-05

申请号：US15281540

申请日：2016-09-30

Applicant: Axcelis Technologies, Inc.

Inventor： Allan D. Weed

IPC: H01L21/683 ,  H01L21/265 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01L21/6833 ,  H01J37/20 ,  H01J37/31 ,  H01J37/3171 ,  H01L21/265 ,  H01L21/67213 ,  H01L21/67751 ,  H01L21/6831 ,  H01L21/68707 ,  H01L21/68728 ,  H01L21/68785

Abstract: An electrostatic chuck for clamping workpieces having differing diameters is provided. A central electrostatic chuck member associated with a first workpiece and a first peripheral electrostatic chuck member associated with a second workpiece are provided. An elevator translates the first peripheral electrostatic chuck member with respect to central electrostatic chuck member between a retracted position and an extended position. In the retracted position, the first workpiece contacts only the first surface. In the extended position, the second workpiece contacts the first surface and the second surface. A first peripheral shield generally shields the second surface when the first peripheral electrostatic chuck member is in the retracted position. Additional peripheral electrostatic chuck members and peripheral shields can be added to accommodate additional workpiece diameters.

公开(公告)号：US09911636B1

公开(公告)日：2018-03-06

申请号：US15281600

申请日：2016-09-30

Applicant: Axcelis Technologies, Inc.

Inventor： Allan D. Weed

IPC: H01J37/36 ,  H01J37/317 ,  H01L21/677 ,  H01L21/683 ,  H01L21/687 ,  H01L21/265 ,  H01J37/20 ,  H01J37/18

CPC classification number: H01L21/67742 ,  H01J37/185 ,  H01J37/20 ,  H01J37/3171 ,  H01L21/265 ,  H01L21/67069 ,  H01L21/67213 ,  H01L21/67718 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67757 ,  H01L21/6833 ,  H01L21/68707 ,  H01L21/68728

Abstract: An electrostatic chuck and gripping system are configured for clamping and processing workpieces having differing diameters. An ion implantation apparatus selectively provides ions to a first workpiece and a second workpiece in a process chamber, where a diameter of the first workpiece is greater the second workpiece. A chuck supports the respective first or second workpiece within the process chamber during exposure to the ions. A load lock chamber isolates a process environment from an external environment and has a workpiece support for the respective first or second workpiece during a transfer of the first or second workpiece between the process chamber and the external environment. A vacuum robot transfers the first or second workpiece between the chuck and workpiece support, and has a gripper mechanism configured to selectively grip the first or second workpiece between a plurality of stepped guides.

公开(公告)号：US10186446B2

公开(公告)日：2019-01-22

申请号：US15281540

申请日：2016-09-30

Applicant: Axcelis Technologies, Inc.

Inventor： Allan D. Weed

IPC: H01L21/683 ,  H01J37/20 ,  H01J37/317 ,  H01L21/265 ,  H01L21/67 ,  H01J37/31 ,  H01L21/677 ,  H01L21/687

Abstract: An electrostatic chuck for clamping workpieces having differing diameters is provided. A central electrostatic chuck member associated with a first workpiece and a first peripheral electrostatic chuck member associated with a second workpiece are provided. An elevator translates the first peripheral electrostatic chuck member with respect to central electrostatic chuck member between a retracted position and an extended position. In the retracted position, the first workpiece contacts only the first surface. In the extended position, the second workpiece contacts the first surface and the second surface. A first peripheral shield generally shields the second surface when the first peripheral electrostatic chuck member is in the retracted position. Additional peripheral electrostatic chuck members and peripheral shields can be added to accommodate additional workpiece diameters.