公开(公告)号：US20170106496A1

公开(公告)日：2017-04-20

申请号：US15176998

申请日：2016-06-08

Applicant: Applied Materials, Inc.

Inventor： Patrick ALA ,  Bo B. DING ,  Yongqi HU ,  Simon YAVELBERG ,  Mats LARSSON

IPC: B24B37/32

CPC classification number: B24B37/32

Abstract: An external clamp ring for a chemical mechanical polishing (CMP) carrier head having a hydrophobic coating, and a carrier head having the same are described herein. In one embodiment, an external clamp ring is provided that includes a cylindrical body having an outer cylindrical wall and an inner cylindrical wall. A hydrophobic layer disposed is on the outer cylindrical wall.

公开(公告)号：US20160271750A1

公开(公告)日：2016-09-22

申请号：US15074089

申请日：2016-03-18

Applicant: Applied Materials, Inc.

Inventor： Yongqi HU ,  Simon YAVELBERG ,  Gangadhar SHEELAVANT ,  Kadthala R. NARENDRNATH

IPC: B24B37/32

CPC classification number: B24B37/32

Abstract: A retaining ring and a chemical mechanical planarization system (CMP) are disclosed. In one embodiment, a retaining ring for a polishing system includes a ring-shaped body having a polished inner diameter. The body has a bottom surface having grooves formed therein, an outer diameter wall, and an inner diameter wall, wherein the inner diameter wall is polished to a roughness average (Ra) of less than about 30 microinches (μin).

Abstract translation: 公开了一种保持环和化学机械平面化系统（CMP）。 在一个实施例中，用于抛光系统的保持环包括具有抛光内径的环形主体。 主体具有形成在其中的槽的底面，外径壁和内径壁，其中内径壁被抛光至小于约30微英寸（μin）的粗糙度平均（Ra）。

公开(公告)号：US20170106495A1

公开(公告)日：2017-04-20

申请号：US14885944

申请日：2015-10-16

Applicant: Applied Materials, Inc.

Inventor： Gangadhar SHEELAVANT ,  Simon YAVELBERG ,  Yongqi HU

IPC: B24B37/32

CPC classification number: B24B37/32

Abstract: Implementations described herein protect a retaining ring for a polishing system from corrosive polishing chemistries. In one embodiment, a retaining ring has a ring-shaped body having a top surface, an inside diameter sidewall, an outer diameter sidewall and a bottom surface. The inside diameter side wall is configured to circumscribe a substrate. The ring shaped body has a rigid ring-shaped portion, a polymeric ring-shaped portion stacked on the rigid ring-shaped portion and covering at least three sides of the rigid ring-shaped portion, a plurality of grooves formed in the bottom surface, and a plurality of wash ports formed through the polymeric ring-shaped portion, wherein the wash ports are isolated from the rigid ring-shaped portion.