专利检索 ap:("Applied Materials, Inc.") AND inv:"Wai-Ming TAM" 第 1 页

1.

发明公开
RESONATOR, LINEAR ACCELERATOR CONFIGURATION AND ION IMPLANTATION SYSTEM HAVING ROTATING EXCITER 审中-公开

公开(公告)号：US20240032183A1

公开(公告)日：2024-01-25

申请号：US18373128

申请日：2023-09-26

申请人： Applied Materials, Inc.

发明人： Costel BILOIU , David T. BLAHNIK , Wai-Ming TAM , Charles T. CARLSON , Frank SINCLAIR

IPC分类号： H05H7/02 , H05H7/12 , H05H9/00

CPC分类号： H05H7/02 , H05H7/12 , H05H9/00 , H05H2007/025

摘要： An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.