公开(公告)号：US20250095952A1

公开(公告)日：2025-03-20

申请号：US18794728

申请日：2024-08-05

Applicant: Applied Materials, Inc.

Inventor： Ori Noked ,  Daniel A. Hall ,  Frank Sinclair ,  Timothy Thomas ,  Samuel Charles Howells ,  Douglas E. Holmgren

IPC: H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/30 ,  H01J37/317

Abstract: An ion implanter, including an ion source generating an ion beam, a set of beamline components directing the ion beam to a substrate along a beam axis, normal to a reference plane, a process chamber housing the substrate to receive the ion beam, and a conoscopy system. The conoscopy system may include: an illumination source directing light to a substrate position, a first polarizer assembly, comprising a first polarizer element and first pair of lenses, disposed on opposite sides of the first polarizer element, and arranged to focus the light at the substrate position; a second polarizer assembly, disposed to receive the light after passing through the substrate position, including a second polarizer element and a second pair of lenses disposed on opposite sides of the second polarizer element, and arranged to focus the light at a sensor, disposed in a detector plane of a detector.

公开(公告)号：US20250053101A1

公开(公告)日：2025-02-13

申请号：US18719681

申请日：2022-12-09

Applicant: Applied Materials, Inc.

Inventor： Assaf Kidron ,  Rudolf Brunner ,  Davidi Kalir ,  Timothy Thomas ,  Anilkumar Borkar ,  Jiawei Shi

IPC: G03F7/00

Abstract: Embodiments of the disclosure relate to digital lithography systems and components thereof. Digital lithography systems may include a rotation assembly for an exposure unit, including a kinematic socket configured to support the exposure unit, the kinematic socket having a socket seat and a sphere received in the socket seat, wherein the socket seat is configured to support a load of the exposure unit during translational movement and the sphere is a pivot point for tip and tilt movement; and a motor configured to rotate the one or more exposure unit via the kinematic socket. The rotation assembly may provide a point of contact for the exposure unit together with two additional points of contact that stabilize movement of the exposure unit. Also disclosed are methods of preparation and use of such systems and components.