公开(公告)号：US20250053101A1

公开(公告)日：2025-02-13

申请号：US18719681

申请日：2022-12-09

Applicant: Applied Materials, Inc.

Inventor： Assaf Kidron ,  Rudolf Brunner ,  Davidi Kalir ,  Timothy Thomas ,  Anilkumar Borkar ,  Jiawei Shi

IPC: G03F7/00

Abstract: Embodiments of the disclosure relate to digital lithography systems and components thereof. Digital lithography systems may include a rotation assembly for an exposure unit, including a kinematic socket configured to support the exposure unit, the kinematic socket having a socket seat and a sphere received in the socket seat, wherein the socket seat is configured to support a load of the exposure unit during translational movement and the sphere is a pivot point for tip and tilt movement; and a motor configured to rotate the one or more exposure unit via the kinematic socket. The rotation assembly may provide a point of contact for the exposure unit together with two additional points of contact that stabilize movement of the exposure unit. Also disclosed are methods of preparation and use of such systems and components.