公开(公告)号：US20250095952A1

公开(公告)日：2025-03-20

申请号：US18794728

申请日：2024-08-05

Applicant: Applied Materials, Inc.

Inventor： Ori Noked ,  Daniel A. Hall ,  Frank Sinclair ,  Timothy Thomas ,  Samuel Charles Howells ,  Douglas E. Holmgren

IPC: H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/30 ,  H01J37/317

Abstract: An ion implanter, including an ion source generating an ion beam, a set of beamline components directing the ion beam to a substrate along a beam axis, normal to a reference plane, a process chamber housing the substrate to receive the ion beam, and a conoscopy system. The conoscopy system may include: an illumination source directing light to a substrate position, a first polarizer assembly, comprising a first polarizer element and first pair of lenses, disposed on opposite sides of the first polarizer element, and arranged to focus the light at the substrate position; a second polarizer assembly, disposed to receive the light after passing through the substrate position, including a second polarizer element and a second pair of lenses disposed on opposite sides of the second polarizer element, and arranged to focus the light at a sensor, disposed in a detector plane of a detector.