公开(公告)号：US10861681B2

公开(公告)日：2020-12-08

申请号：US15961482

申请日：2018-04-24

Applicant: Applied Materials, Inc.

Inventor： James L'Heureux ,  Ryan T. Downey ,  David Muquing Hou ,  Yan Rozenzon

IPC: H01J37/32 ,  B01D53/32 ,  H01L21/67

Abstract: Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.

公开(公告)号：US12203828B2

公开(公告)日：2025-01-21

申请号：US17240677

申请日：2021-04-26

Applicant: Applied Materials, Inc.

Inventor： Ryan T. Downey ,  Hemant P. Mungekar ,  James L'Heureux ,  Andreas Neuber ,  Michael W. Johnson ,  Joseph A. Van Gompel ,  Gino Gerardo Crispieri ,  Tony H. Tong ,  Maxime Cayer ,  John L Koenig ,  Mike M. Huang

IPC: G01M99/00

Abstract: The present disclosure relates to systems and methods for detecting anomalies in a semiconductor processing system. According to certain embodiments, one or more external sensors are mounted to a sub-fab component, communicating with the processing system via a communication channel different than a communication channel utilized by the sub-fab component and providing extrinsic sensor data that the sub-fab component is not configured to provide. The extrinsic sensor data may be combined with sensor data from a processing tool of the system and/or intrinsic sensor data of the sub-fab component to form virtual sensor data. In the event the virtual data exceeds or falls below a threshold, an intervention or a maintenance signal is dispatched, and in certain embodiments, an intervention or maintenance action is taken by the system.