公开(公告)号：US11551917B2

公开(公告)日：2023-01-10

申请号：US16793983

申请日：2020-02-18

Applicant: Applied Materials, Inc.

Inventor： Joseph A. Van Gompel ,  James L'Heureux

IPC: H01L21/3065 ,  H01J37/32

Abstract: One or more embodiments described herein relate to abatement systems for reducing Br2 and Cl2 in semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Cl2 gases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and “excites” the gases within the process chamber. When HBr is energized, it forms Br2. Br2 and Cl2 are corrosive and toxic. However, the addition of H2O in the plasma reactor quenches the Br2 and Cl2 emissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.

公开(公告)号：US12203828B2

公开(公告)日：2025-01-21

申请号：US17240677

申请日：2021-04-26

Applicant: Applied Materials, Inc.

Inventor： Ryan T. Downey ,  Hemant P. Mungekar ,  James L'Heureux ,  Andreas Neuber ,  Michael W. Johnson ,  Joseph A. Van Gompel ,  Gino Gerardo Crispieri ,  Tony H. Tong ,  Maxime Cayer ,  John L Koenig ,  Mike M. Huang

IPC: G01M99/00

Abstract: The present disclosure relates to systems and methods for detecting anomalies in a semiconductor processing system. According to certain embodiments, one or more external sensors are mounted to a sub-fab component, communicating with the processing system via a communication channel different than a communication channel utilized by the sub-fab component and providing extrinsic sensor data that the sub-fab component is not configured to provide. The extrinsic sensor data may be combined with sensor data from a processing tool of the system and/or intrinsic sensor data of the sub-fab component to form virtual sensor data. In the event the virtual data exceeds or falls below a threshold, an intervention or a maintenance signal is dispatched, and in certain embodiments, an intervention or maintenance action is taken by the system.

公开(公告)号：US12065359B2

公开(公告)日：2024-08-20

申请号：US17230514

申请日：2021-04-14

Applicant: Applied Materials, Inc.

Inventor： Joseph A. Van Gompel

IPC: C01B7/20 ,  B01J19/08 ,  B01J19/14 ,  C01B21/04

CPC classification number: C01B7/20 ,  B01J19/081 ,  B01J19/14 ,  C01B21/0405 ,  B01J2219/00042 ,  B01J2219/0894

Abstract: A method and apparatus for generation of fluorine gas (F2) in situ at the point of use is provided. The portable fluorine generator includes a dilution system disposed within a housing and operable to mix a feed gas comprising fluorine with an inert gas. The portable fluorine generator further includes a plasma reactor unit disposed within the housing and operable to separate fluorine (F2) from the feed gas comprising fluorine.