SUSCEPTOR TRANSFER FOR PROCESS CHAMBER
    1.
    发明公开

    公开(公告)号:US20240105485A1

    公开(公告)日:2024-03-28

    申请号:US18299119

    申请日:2023-04-12

    CPC classification number: H01L21/67748 H01L21/68707

    Abstract: A method of moving a susceptor in a processing system, suitable for use in semiconductor processing, is provided. The method includes: moving a first susceptor from an interior volume of a first enclosure to an interior volume of a process chamber during a first time period; and positioning, during a second time period, a first substrate on the first susceptor when the first susceptor is in the process chamber, wherein the interior volume of the first enclosure and interior volume of the process chamber are maintained at a non-atmospheric pressure from the beginning of the first time period until the end of the second time period.

    CONTACTLESS LATCH AND COUPLING FOR VACUUM WAFER TRANSFER CASSETTE

    公开(公告)号:US20200286760A1

    公开(公告)日:2020-09-10

    申请号:US16752502

    申请日:2020-01-24

    Abstract: Embodiments of the present disclosure relate to a substrate transfer device having a contactless latch and contactless coupling providing the ability to lock and unlock the substrate transfer device at atmospheric and vacuum pressure with without particle generation at a base of the substrate transfer device, the contactless latch, and the contactless coupling. The substrate transfer device includes a lid having one or more lid grooves, a base having one or more base grooves, and a rotation member rotatably coupled to the lid. Each flange of one or more flanges of the substrate transfer device is rotatable in aligned lid grooves and base grooves, and each flange of the one or more flanges has an arm with a ferromagnetic material coupled thereto. The base is coupled to the lid when the ferromagnetic material of the arm is aligned and spaced from a magnetic material of a slot of the one or more base grooves.

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