公开(公告)号：US20240178035A1

公开(公告)日：2024-05-30

申请号：US18435175

申请日：2024-02-07

Applicant: Applied Materials, Inc.

Inventor： Andrew MYLES ,  Denis Martin KOOSAU ,  Peter MURAOKA ,  Phillip CRIMINALE

IPC: H01L21/68 ,  H01J37/32 ,  H01L21/687

CPC classification number: H01L21/68 ,  H01J37/32642 ,  H01J37/3288 ,  H01J37/32908 ,  H01J37/32935 ,  H01J37/3299 ,  H01L21/681 ,  H01L21/68721 ,  H01L21/68735 ,  H01L21/68742

Abstract: Apparatus and methods for calibrating a height-adjustable edge ring are described herein. In one example, a calibration jig for positioning an edge ring relative to a reference surface is provided that includes a transparent plate, a plurality of sensors coupled to a first side of the transparent plate, and a plurality of contact pads coupled to an opposing second side of the transparent plate.

公开(公告)号：US20240321610A1

公开(公告)日：2024-09-26

申请号：US18676429

申请日：2024-05-28

Applicant: Applied Materials, Inc.

Inventor： Yaoling PAN ,  Patrick John TAE ,  Michael D. WILLWERTH ,  Leonard M. TEDESCHI ,  Daniel Sang BYUN ,  Philip Allan KRAUS ,  Phillip CRIMINALE ,  Changhun LEE ,  Rajinder DHINDSA ,  Andreas SCHMID ,  Denis M. KOOSAU

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/66 ,  H03K17/955

CPC classification number: H01L21/67259 ,  H01J37/32477 ,  H01J37/3288 ,  H01L22/12 ,  H03K17/955 ,  H01J2237/022

Abstract: The present disclosure generally relates to a method and apparatus for determining a metric related to erosion of a ring assembly used in an etching within a plasma processing chamber. In one example, the apparatus is configured to obtain a metric indicative of erosion on an edge ring disposed on a substrate support assembly in a plasma processing chamber. A sensor obtains the metric for the edge ring. The metric correlates to the quantity of erosion in the edge ring. In another example, the ring sensor may be arranged outside of a periphery of a substrate support assembly. The metric may be acquired by the ring sensor through a plasma screen.

公开(公告)号：US20200294836A1

公开(公告)日：2020-09-17

申请号：US16352349

申请日：2019-03-13

Applicant: Applied Materials, Inc.

Inventor： Phillip CRIMINALE ,  Zhiqiang GUO ,  Andrew MYLES

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/66 ,  H05B1/02

Abstract: Implementations described herein provide a method for calibrating a temperature of a substrate support assembly which enables discrete tuning of the temperature profile of a substrate support assembly. In one embodiment, a system, comprises a memory, wherein the memory includes an application program configured to perform an operation on a substrate support assembly, a control board disposed in a substrate support assembly, wherein the control board comprises a processor having an wireless interface, a pulse width modification (PWM) heater controller, wherein the processor is connected with the memory to read and access the application program from the memory when in operation, and a heating element coupled to the pulse width modification (PWM) heater controller, wherein the heating element comprises a plurality of spatially tunable heaters that are individually tunable by the pulse width modification (PWM) heater controller

公开(公告)号：US20220277982A1

公开(公告)日：2022-09-01

申请号：US17750295

申请日：2022-05-20

Applicant: Applied Materials, Inc.

Inventor： Phillip CRIMINALE ,  Zhiqiang GUO ,  Andrew MYLES

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/66 ,  H05B1/02

Abstract: Implementations described herein provide a method for calibrating a temperature of a substrate support assembly which enables discrete tuning of the temperature profile of a substrate support assembly. In one embodiment, a system, comprises a memory, wherein the memory includes an application program configured to perform an operation on a substrate support assembly, a control board disposed in a substrate support assembly, wherein the control board comprises a processor having an wireless interface, a pulse width modification (PWM) heater controller, wherein the processor is connected with the memory to read and access the application program from the memory when in operation, and a heating element coupled to the pulse width modification (PWM) heater controller, wherein the heating element comprises a plurality of spatially tunable heaters that are individually tunable by the pulse width modification (PWM) heater controller.

公开(公告)号：US20200037399A1

公开(公告)日：2020-01-30

申请号：US16595801

申请日：2019-10-08

Applicant: Applied Materials, Inc.

Inventor： Chunlei ZHANG ,  Phillip CRIMINALE ,  Steven E. BABAYAN ,  David ULLSTROM

IPC: H05B1/02 ,  H01L21/67 ,  H01L21/683 ,  H01L21/66

Abstract: Implementations described herein provide a method for processing a substrate on a substrate support assembly which enables both lateral and azimuthal tuning of the heat transfer between an electrostatic chuck and a substrate. The method includes processing a first substrate using a first temperature profile on a substrate support assembly having primary heaters and spatially tunable heaters. A deviation profile is determined from a result of processing the first substrate. The spatially tunable heaters are controlled in response to the deviation profile to enable discrete lateral and azimuthal tuning of local hot or cold spots on the substrate support assembly in forming a second temperature profile. A second substrate is then processed using the second temperature profile.