公开(公告)号：US11315819B2

公开(公告)日：2022-04-26

申请号：US16880540

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/683 ,  H05B3/00 ,  H05F3/00 ,  H01J37/05 ,  H01J37/141 ,  H05B3/26 ,  H01J37/147 ,  H02N13/00

Abstract: A method may include providing a substrate on a clamp, and directing radiation from an illumination source to the substrate when the substrate is disposed on the clamp during substrate processing, wherein the radiation is characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.

公开(公告)号：US20210366756A1

公开(公告)日：2021-11-25

申请号：US16880540

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/683 ,  H05F3/00 ,  H05B3/00

Abstract: A method may include providing a substrate on a clamp, and directing radiation from an illumination source to the substrate when the substrate is disposed on the clamp during substrate processing, wherein the radiation is characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.

公开(公告)号：US20210366689A1

公开(公告)日：2021-11-25

申请号：US16880500

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01J37/317 ,  H01L21/683 ,  G02B26/10 ,  G02B26/08 ,  H01J37/20

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to a front side of the substrate, opposite the back side of the substrate.

公开(公告)号：US11875967B2

公开(公告)日：2024-01-16

申请号：US16880500

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01J37/317 ,  H01L21/683 ,  H01J37/20 ,  G02B26/08 ,  G02B26/10 ,  H01L21/687

CPC classification number: H01J37/3171 ,  G02B26/0816 ,  G02B26/0875 ,  G02B26/10 ,  H01J37/20 ,  H01L21/687 ,  H01L21/6833

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to a front side of the substrate, opposite the back side of the substrate.

公开(公告)号：US11538714B2

公开(公告)日：2022-12-27

申请号：US16880518

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/683

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.

公开(公告)号：US20210366759A1

公开(公告)日：2021-11-25

申请号：US16880518

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/687

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.

公开(公告)号：US20210366757A1

公开(公告)日：2021-11-25

申请号：US16880559

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/027

Abstract: A method may include providing a substrate in a process chamber, directing radiation from an illumination source to the substrate when the substrate is disposed in the process chamber, and processing the substrate by providing a processing species to the substrate, separate from the radiation, when the substrate is disposed in the process chamber. As such, the radiation may be characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.