公开(公告)号：US11651986B2

公开(公告)日：2023-05-16

申请号：US17159638

申请日：2021-01-27

Applicant: Applied Materials, Inc.

Inventor： Jonathan D. Fischer ,  Steven M. Anella ,  Manohara Kumar

IPC: H01T23/00 ,  H01L21/683 ,  H01L21/67 ,  H02N13/00

CPC classification number: H01L21/6833 ,  H01L21/67103 ,  H02N13/00

Abstract: An insulating system to reduce or eliminate the possibility of arcing while the pressure within a chamber is being varied is disclosed. The system is operable at cryogenic temperatures, such that the insulating system is able to accommodate dimensional changes due to thermal contraction. The insulating system, which includes a housing having one or more bores, is disposed between the two components which are to be electrically connected. An electrical contact, which may be spring loaded, passes through the bore and is used to electrically connect the two components. The ends of the electrical contact are surrounded by an insulating extender which extends from the housing. In one embodiment, a spring-loaded piston is used as the insulating extender. This insulating extender compensates for changes in dimension due to thermal contraction and covers the portion of the electrical contact that extends beyond the outer surface of the housing.

公开(公告)号：US20220238365A1

公开(公告)日：2022-07-28

申请号：US17159638

申请日：2021-01-27

Applicant: Applied Materials, Inc.

Inventor： Jonathan D. Fischer ,  Steven M. Anella ,  Manohara Kumar

IPC: H01L21/683 ,  H01L21/67

Abstract: An insulating system to reduce or eliminate the possibility of arcing while the pressure within a chamber is being varied is disclosed. The system is operable at cryogenic temperatures, such that the insulating system is able to accommodate dimensional changes due to thermal contraction. The insulating system, which includes a housing having one or more bores, is disposed between the two components which are to be electrically connected. An electrical contact, which may be spring loaded, passes through the bore and is used to electrically connect the two components. The ends of the electrical contact are surrounded by an insulating extender which extends from the housing. In one embodiment, a spring-loaded piston is used as the insulating extender. This insulating extender compensates for changes in dimension due to thermal contraction and covers the portion of the electrical contact that extends beyond the outer surface of the housing.

公开(公告)号：US11315819B2

公开(公告)日：2022-04-26

申请号：US16880540

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/683 ,  H05B3/00 ,  H05F3/00 ,  H01J37/05 ,  H01J37/141 ,  H05B3/26 ,  H01J37/147 ,  H02N13/00

Abstract: A method may include providing a substrate on a clamp, and directing radiation from an illumination source to the substrate when the substrate is disposed on the clamp during substrate processing, wherein the radiation is characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.

公开(公告)号：US20210366756A1

公开(公告)日：2021-11-25

申请号：US16880540

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/683 ,  H05F3/00 ,  H05B3/00

Abstract: A method may include providing a substrate on a clamp, and directing radiation from an illumination source to the substrate when the substrate is disposed on the clamp during substrate processing, wherein the radiation is characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.

公开(公告)号：US20210366689A1

公开(公告)日：2021-11-25

申请号：US16880500

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01J37/317 ,  H01L21/683 ,  G02B26/10 ,  G02B26/08 ,  H01J37/20

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to a front side of the substrate, opposite the back side of the substrate.

公开(公告)号：US11875967B2

公开(公告)日：2024-01-16

申请号：US16880500

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01J37/317 ,  H01L21/683 ,  H01J37/20 ,  G02B26/08 ,  G02B26/10 ,  H01L21/687

CPC classification number: H01J37/3171 ,  G02B26/0816 ,  G02B26/0875 ,  G02B26/10 ,  H01J37/20 ,  H01L21/687 ,  H01L21/6833

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to a front side of the substrate, opposite the back side of the substrate.

公开(公告)号：US11538714B2

公开(公告)日：2022-12-27

申请号：US16880518

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/683

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.

公开(公告)号：US20210366759A1

公开(公告)日：2021-11-25

申请号：US16880518

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/687

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.

公开(公告)号：US20210366757A1

公开(公告)日：2021-11-25

申请号：US16880559

申请日：2020-05-21

Applicant: Applied Materials, Inc.

Inventor： Qin Chen ,  Julian G. Blake ,  Michael W. Osborne ,  Steven M. Anella ,  Jonathan D. Fischer

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/027

Abstract: A method may include providing a substrate in a process chamber, directing radiation from an illumination source to the substrate when the substrate is disposed in the process chamber, and processing the substrate by providing a processing species to the substrate, separate from the radiation, when the substrate is disposed in the process chamber. As such, the radiation may be characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.