公开(公告)号：US20220139679A1

公开(公告)日：2022-05-05

申请号：US17088407

申请日：2020-11-03

Applicant: Applied Materials, Inc.

Inventor： Job George KONNOTH JOSEPH ,  Sathya Swaroop GANTA ,  Kallol BERA ,  Andrew NGUYEN ,  Jay D. PINSON, II ,  Akshay DHANAKSHIRUR ,  Kaushik Comandoor ALAYAVALLI ,  Canfeng LAI ,  Ren-Guan DUAN ,  Jennifer Y. SUN ,  Anil Kumar KALAL ,  Abhishek PANDEY

IPC: H01J37/32 ,  H01J37/20

Abstract: A plasma chamber includes a chamber body having a processing region therewithin, a liner disposed on the chamber body, the liner surrounding the processing region, a substrate support disposed within the liner, a magnet assembly comprising a plurality of magnets disposed around the liner, and a magnetic-material shield disposed around the liner, the magnetic-material shield encapsulating the processing region near the substrate support.