公开(公告)号：US09835950B2

公开(公告)日：2017-12-05

申请号：US15112602

申请日：2014-12-19

Applicant: ASML Netherlands B.V.

Inventor： Markus Franciscus Antonius Eurlings ,  Niek Antonius Jacobus Maria Kleemans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Ramon Mark Hofstra ,  Oscar Franciscus Jozephus Noordman ,  Tien Nang Pham ,  Jan Bernard Plechelmus Van Schoot ,  Jiun-Cheng Wang ,  Kevin Weimin Zhang

IPC: G03B27/54 ,  G03B27/72 ,  H05G2/00 ,  G03F7/20 ,  G02B27/09 ,  G02B19/00

CPC classification number: G03F7/70091 ,  G02B19/0019 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/005 ,  H05G2/008

Abstract: A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

公开(公告)号：US11237491B2

公开(公告)日：2022-02-01

申请号：US17048834

申请日：2019-04-10

Applicant: ASML Netherlands B.V.

Inventor： Ramon Mark Hofstra ,  Andrey Sergeevich Tychkov ,  Francois Charles Dominique Deneuville ,  Gerardus Hubertus Petrus Maria Swinkels ,  Petrus Adrianus Theodorus Maria Ruijs

IPC: G03F7/20 ,  G02B27/14

Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.

公开(公告)号：US10222702B2

公开(公告)日：2019-03-05

申请号：US15550855

申请日：2016-01-21

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan Bleeker ,  Ramon Mark Hofstra ,  Erik Petrus Buurman ,  Johannes Hubertus Josephina Moors ,  Alexander Matthijs Struycken ,  Harm-Jan Voorma ,  Sumant Sukdew Ramanujan Oemrawsingh ,  Markus Franciscus Antonius Eurlings ,  Peter Frans Maria Muys

IPC: G03F7/00 ,  G03F7/20 ,  H01S3/00 ,  G02B27/14 ,  H05G2/00 ,  H01S3/23

Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.