公开(公告)号：US20220035256A1

公开(公告)日：2022-02-03

申请号：US17276533

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Youping ZHANG ,  Weixuan HU ,  Fei YAN ,  Wei PENG ,  Vivek Kumar JAIN

IPC: G03F7/20

Abstract: A method of hot spot ranking for a patterning process. The method includes obtaining (i) a set of hot spots of a patterning process, (ii) measured values of one or more parameters of the patterning process corresponding to the set of hot spots, and (ii) simulated values of the one or more parameters of the patterning process corresponding to the set of hot spots; determining a measurement feedback based on the measured values and the simulated values of the one or more parameters of the patterning process; and determining, via simulation of a process model of the patterning process, a ranking of a hot spot within the set of hot spots based on the measurement feedback.

公开(公告)号：US20230273528A1

公开(公告)日：2023-08-31

申请号：US18018034

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Rencheng SUN ,  Qi JIA ,  Meng LIU ,  Weixuan HU ,  Jen-Yi WUU ,  Hao CHEN

IPC: G03F7/20 ,  G03F7/00 ,  G06N20/00 ,  G05B19/4099

CPC classification number: G03F7/705 ,  G03F7/70441 ,  G03F7/706841 ,  G06N20/00 ,  G05B19/4099 ,  G05B2219/45031

Abstract: A method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.