公开(公告)号：US20250147433A1

公开(公告)日：2025-05-08

申请号：US18834131

申请日：2023-01-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Tsung-Pao FANG ,  Been-Der CHEN ,  Wei-Yin LIN ,  Fei YAN ,  Meng LIU ,  Rencheng SUN

IPC: G03F7/00 ,  G01N23/2251

Abstract: Selecting one or more lists of fields of view of a pattern layout for scanning electron microscope measurement and/or other inspection. A set of candidate fields of view is determined based on pattern groups of a pattern layout and a constraint on a characteristic of a given field of view. The characteristic of a given field of view includes a distance from the given field of view to another field of view and/or a size of the given field of view. The one or more lists are selected from the set of candidate fields of view according to prescribed criteria for combinations of fields of view included in the one or more lists. The prescribed criteria causes inclusion of an optimally diverse group of patterns in a predetermined number of lists of fields of view.