公开(公告)号：US11681233B2

公开(公告)日：2023-06-20

申请号：US17282029

申请日：2019-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost De Hoogh ,  Alain Louis Claude Leroux ,  Alexander Marinus Arnoldus Huijberts ,  Christiaan Louis Valentin ,  Robert Coenraad Wit ,  Dries Vaast Paul Hemschoote ,  Frits Van Der Meulen ,  Johannes Franciscus Martinus Van Santvoort ,  Radu Donose

IPC: G03F7/20 ,  G03F7/00 ,  F25D3/10

CPC classification number: G03F7/70875 ,  F25D3/10

Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.