公开(公告)号：US11681233B2

公开(公告)日：2023-06-20

申请号：US17282029

申请日：2019-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost De Hoogh ,  Alain Louis Claude Leroux ,  Alexander Marinus Arnoldus Huijberts ,  Christiaan Louis Valentin ,  Robert Coenraad Wit ,  Dries Vaast Paul Hemschoote ,  Frits Van Der Meulen ,  Johannes Franciscus Martinus Van Santvoort ,  Radu Donose

IPC: G03F7/20 ,  G03F7/00 ,  F25D3/10

CPC classification number: G03F7/70875 ,  F25D3/10

Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.

公开(公告)号：US20150192861A1

公开(公告)日：2015-07-09

申请号：US14419425

申请日：2013-07-30

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Arthur Winfried Eduardus Minnaert ,  Johannus Elisabeth Hubertus Muitjens ,  Andrei Mikhailovich Yakunin ,  Luigi Scaccabarozzi ,  Hans Joerg Mallmann ,  Kurstat Bal ,  Carlo Cornelis Maria Luijten ,  Han-Kwang Nienhuys ,  Alexander Marinus Arnoldus Huijberts ,  Paulus Albertus Maria Gasseling ,  Pedro Julian Rizo Diago ,  Maarten Van Kampen ,  Nicolaas Aldegonda Jan Maria Van Aerle

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract translation: 公开了一种设置有光谱纯度滤光器的光刻设备，其可以设置在以下一个或多个位置：（a）在照明系统中，（b）与图案形成装置相邻，辐射束中的静态位置或 固定用于与图案形成装置一起运动，（c）在投影系统中，和（d）邻近衬底台。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜。 膜可以设置有保护性盖层和/或薄金属透明层。

公开(公告)号：US09606445B2

公开(公告)日：2017-03-28

申请号：US14419425

申请日：2013-07-30

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Arthur Winfried Eduardus Minnaert ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Andrei Mikhailovich Yakunin ,  Luigi Scaccabarozzi ,  Hans Joerg Mallmann ,  Kurstat Bal ,  Carlo Cornelis Maria Luijten ,  Han-Kwang Nienhuys ,  Alexander Marinus Arnoldus Huijberts ,  Paulus Albertus Maria Gasseling ,  Pedro Julian Rizo Diago ,  Maarten Van Kampen ,  Nicolaas Aldegonda Jan Maria Van Aerle

IPC: G03F7/20 ,  G21K1/10

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.