公开(公告)号：US20240077380A1

公开(公告)日：2024-03-07

申请号：US18262511

申请日：2022-01-05

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes VAN DE WAL ,  Koos VAN BERKEL ,  Victor Sebastiaan DOLK ,  Stijn Clyde Natalia THISSEN ,  Mauritius Gerardus Elisabeth SCHNEIDERS ,  Adrianus Hendrik KOEVOETS

IPC: G01M11/02 ,  G01K1/02 ,  G03F7/00

CPC classification number: G01M11/0242 ,  G01K1/026 ,  G03F7/705 ,  G03F7/706 ,  G03F7/70891

Abstract: A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating an irradiance profile for at least one optical element of the projection system from a power and illumination source pupil of the radiation beam, estimating a temperature distribution as a function of time in the at least one optical element of the projection system using the calculated irradiance profile for the at least one optical element of the projection system; calculating the thermally induced aberrations of the projection system based on the estimated temperature distribution and a thermal expansion parameter map associated with the at least one optical element of the projection system, wherein the thermal expansion parameter map is a spatial map indicating spatial variations of thermal expansion parameters in the at least one optical element of the projection system or a uniform map.

公开(公告)号：US20170212431A1

公开(公告)日：2017-07-27

申请号：US15129380

申请日：2015-04-01

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes VAN DE WAL ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Jeroen Johannes Theodorus Hendrikus DE BEST ,  Jan VAN EIJK

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70783 ,  G03F7/709

Abstract: A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.

公开(公告)号：US20150316860A1

公开(公告)日：2015-11-05

申请号：US14647778

申请日：2013-11-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Marinus Maria Johannes VAN DE WAL ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Ramidin Izair KAMIDI ,  Khalid MANSSOURI

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.

Abstract translation: 光刻设备包括具有顺应动力学的被驱动物体; 多个致动器，被配置为作用在从动对象上，其中所述多个致动器在致动器的自由度中被过度确定; 控制系统，包括变换矩阵，其被配置为响应于设定点为所述多个致动器中的每一个生成控制器输出信号，其中所述变换矩阵被配置为使得所述控制器输出信号不激发所述被驱动对象的顺应动态 至少一个自由度。