公开(公告)号：US20170212431A1

公开(公告)日：2017-07-27

申请号：US15129380

申请日：2015-04-01

Applicant: ASML Netherlands B.V.

Inventor： Marinus Maria Johannes VAN DE WAL ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Jeroen Johannes Theodorus Hendrikus DE BEST ,  Jan VAN EIJK

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70783 ,  G03F7/709

Abstract: A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.

公开(公告)号：US20170199468A1

公开(公告)日：2017-07-13

申请号：US15314440

申请日：2015-05-01

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Nic Jasper DIRKX ,  Ramidin Izair KAMIDI ,  Wilhelmus Franciscus Johannes SIMONS

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F9/7088 ,  G03F9/7092

Abstract: An object positioning system including a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.

公开(公告)号：US20180368241A1

公开(公告)日：2018-12-20

申请号：US15781885

申请日：2016-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Frederik DIJKSMAN ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Ronald Johannes HULTERMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Peter Wilhelm Hendrik VAN PUTTEN

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005

Abstract: An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.

公开(公告)号：US20150316860A1

公开(公告)日：2015-11-05

申请号：US14647778

申请日：2013-11-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Marinus Maria Johannes VAN DE WAL ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Ramidin Izair KAMIDI ,  Khalid MANSSOURI

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.

Abstract translation: 光刻设备包括具有顺应动力学的被驱动物体; 多个致动器，被配置为作用在从动对象上，其中所述多个致动器在致动器的自由度中被过度确定; 控制系统，包括变换矩阵，其被配置为响应于设定点为所述多个致动器中的每一个生成控制器输出信号，其中所述变换矩阵被配置为使得所述控制器输出信号不激发所述被驱动对象的顺应动态 至少一个自由度。