公开(公告)号：US20190339211A1

公开(公告)日：2019-11-07

申请号：US16465161

申请日：2017-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Ralph Timotheus HUIJGEN ,  Marc Jurian KEA ,  Marcel Theodorus Maria VAN KESSEL ,  Masashi ISHIBASHI ,  Chi-Hsiang FAN ,  Hakki Ergün CEKLI ,  Youping ZHANG ,  Maurits VAN DER SCHAAR ,  Liping REN

IPC: G01N21/956 ,  G03F7/20 ,  H01L21/66 ,  G03F9/00

Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.

公开(公告)号：US20190384164A1

公开(公告)日：2019-12-19

申请号：US16485506

申请日：2018-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Theodorus Maria VAN KESSEL ,  Frederik Eduard DE JONG ,  Cornelis Melchior BROUWER ,  Kevin VAN DE RUIT ,  Chung-Hsun LI

IPC: G03F1/62 ,  G03F7/20

Abstract: A method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method includes quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features, such as one or more metrology targets, formed on the substrate by the substrate patterning process. A process control correction is then determined based on the quantification of the effect of the non-uniform pellicle degradation.