公开(公告)号：US20180095369A1

公开(公告)日：2018-04-05

申请号：US15565082

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Kevin VAN DE RUIT ,  Bart Dinand PAARHUIS ,  Jean-Philippe Xavier VAN DAMME ,  Johannes ONVLEE ,  Cornelis Melchior BROUWER ,  Pieter Jacob KRAMER

IPC: G03F7/20 ,  G03F1/62

CPC classification number: G03F7/70983 ,  G01B2210/56 ,  G03F1/62 ,  G03F7/2002 ,  G03F7/70258 ,  G03F7/7085

Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

公开(公告)号：US20220155698A1

公开(公告)日：2022-05-19

申请号：US17440251

申请日：2020-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Kevin VAN DE RUIT ,  Roy WERKMAN ,  Jochem Sebastiaan WILDENBERG

IPC: G03F9/00 ,  G03F7/20

Abstract: A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.

公开(公告)号：US20190384164A1

公开(公告)日：2019-12-19

申请号：US16485506

申请日：2018-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Theodorus Maria VAN KESSEL ,  Frederik Eduard DE JONG ,  Cornelis Melchior BROUWER ,  Kevin VAN DE RUIT ,  Chung-Hsun LI

IPC: G03F1/62 ,  G03F7/20

Abstract: A method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method includes quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features, such as one or more metrology targets, formed on the substrate by the substrate patterning process. A process control correction is then determined based on the quantification of the effect of the non-uniform pellicle degradation.