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公开(公告)号:US20190242782A1
公开(公告)日:2019-08-08
申请号:US16253338
申请日:2019-01-22
Applicant: ASML NETHERLANDS B.V.
Inventor: Mariya Vyacheslavivna MEDVEDYEVA , Anagnostis TSIATMAS , Hugo Augustinus Joseph CRAMER , Martinus Hubertus Maria VAN WEERT , Bastiaan Onne FAGGINGER AUER , Xiaoxin SHANG , Johan Maria VAN BOXMEER , Bert VERSTRAETEN
IPC: G01M11/02
CPC classification number: G01M11/0228 , G02B7/38 , G03F7/70625 , G03F7/70633 , G03F7/70641
Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.
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公开(公告)号:US20190107786A1
公开(公告)日:2019-04-11
申请号:US16144013
申请日:2018-09-27
Applicant: ASML Netherlands B.V.
Inventor: Johan Maria VAN BOXMEER , Marinus Johannes Maria VAN DAM , Koos VAN BERKEL , Sietse Thijmen VAN DER POST , Johannes Hubertus Antonius VAN DE RIJDT
Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.
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