公开(公告)号：US10175585B2

公开(公告)日：2019-01-08

申请号：US14473643

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert Douglas Watso ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Antonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC: G06F7/20 ,  G03F7/20

Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

公开(公告)号：US09638643B2

公开(公告)日：2017-05-02

申请号：US14389075

申请日：2013-03-28

Applicant: ASML Netherlands B.V. ,  TNO

Inventor： Antonius Martinus Cornelis Petrus De Jong ,  Jacques Cor Johan Van Der Donck

IPC: G01N21/00 ,  G01N21/94 ,  G03F7/20 ,  G03F1/82 ,  B32B37/24 ,  B32B38/10 ,  G01N21/956 ,  G01N21/47 ,  G01N1/02 ,  G01N1/28

CPC classification number: G01N21/94 ,  B32B37/24 ,  B32B38/10 ,  B32B2037/243 ,  G01N21/47 ,  G01N21/956 ,  G01N2001/028 ,  G01N2001/2833 ,  G01N2201/06113 ,  G01N2201/105 ,  G03F1/82 ,  G03F7/7085 ,  G03F7/70908

Abstract: A particulate contamination measurement method and apparatus are discussed. The method, for example, comprises pressing a measurement surface (5) of a polyurethane elastomer (2) against a surface (7) to be measured, removing the polyurethane elastomer from the surface without leaving residues, then using an optical apparatus (11) to detect particles (8) which have been removed by the polyurethane elastomer from the surface and which have become attached to the polyurethane elastomer.

公开(公告)号：US20150055102A1

公开(公告)日：2015-02-26

申请号：US14473643

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert Douglas WATSO ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Antonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.