-
公开(公告)号：US10955353B2
公开(公告)日：2021-03-23
申请号：US16270155
申请日：2019-02-07
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
-
公开(公告)号：US20150055102A1
公开(公告)日：2015-02-26
申请号：US14473643
申请日：2014-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert Douglas WATSO , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Antonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
-
公开(公告)号：US11525786B2
公开(公告)日：2022-12-13
申请号：US17192276
申请日：2021-03-04
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cédric Désiré Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
-
公开(公告)号：US10394137B2
公开(公告)日：2019-08-27
申请号：US15968743
申请日：2018-05-01
Applicant: ASML Netherlands B.V.
Inventor： Youri Johannes Laurentius Maria Van Dommelen , Peter David Engblom , Lambertus Gerardus Maria Kessels , Arie Jeffrey Den Boef , Kaustuve Bhattacharyya , Paul Christiaan Hinnen , Marco Johannes Annemarie Pieters
IPC: G03F7/20
Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
-
Patent Agency Ranking
公开(公告)号：US10175585B2
公开(公告)日：2019-01-08
申请号：US14473643
申请日：2014-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Antonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
-
公开(公告)号：US20140055788A1
公开(公告)日：2014-02-27
申请号：US14011663
申请日：2013-08-27
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Maria DEN BOEF , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC: G03F7/20
CPC classification number: G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
-
公开(公告)号：US10241055B2
公开(公告)日：2019-03-26
申请号：US14264547
申请日：2014-04-29
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
-
公开(公告)号：US10001711B2
公开(公告)日：2018-06-19
申请号：US15104212
申请日：2014-11-20
Applicant: ASML Netherlands B.V.
Inventor： Youri Johannes Laurentius Maria Van Dommelen , Peter David Engblom , Lambertus Gerardus Maria Kessels , Arie Jeffrey Den Boef , Kaustuve Bhattacharyya , Paul Christiaan Hinnen , Marco Johannes Annemarie Pieters
IPC: G03F7/20
CPC classification number: G03F7/70641 , G03F7/70683
Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
-
9.发明授权Method and apparatus for angular-resolved spectroscopic lithography characterization 有权用于角分辨光谱光刻特征的方法和装置公开(公告)号：US08760662B2
公开(公告)日：2014-06-24
申请号：US14011663
申请日：2013-08-27
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cédric Désiré Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
IPC: G01J3/45
CPC classification number: G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
Abstract translation: 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。
-
-
-
-
-
-
-
-
Search Results
9
records
(took 0.018 seconds)
