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公开(公告)号：US20220066411A1
公开(公告)日：2022-03-03
申请号：US17379728
申请日：2021-07-19
Applicant: APPLIED MATERIALS, INC.
Inventor： Upendra V. Ummethala , Blake Erickson , Prashanth Kumar , Michael Kutney , Steven Trey Tindel , Zhaozhao Zhu
IPC: G05B19/401 , G06N20/00 , G06N5/04
Abstract: Methods and systems for detecting and correcting substrate process drift using machine learning are provided. Data associated with processing each of a first set of substrates at a manufacturing system according to a process recipe is provided as input to a trained machine learning model. One or more outputs are obtained from the trained machine learning model. An amount of drift of a first set of metrology measurement values for the first set of substrates from a target metrology measurement value is determined from the one or more outputs. Process recipe modification identifying one or more modifications to the process recipe is also determined. For each modification, an indication of a level of confidence that a respective modification to the process recipe satisfies a drift criterion for a second set of substrates is determined. In response to an identification of the respective modification with a level of confidence that satisfies a level of confidence criterion, the process recipe is updated based on the respective modification.
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公开(公告)号：USD1045924S1
公开(公告)日：2024-10-08
申请号：US29907881
申请日：2024-01-09
Applicant: Applied Materials, Inc.
Designer： Sidharth Bhatia , Zhaozhao Zhu , Jeffrey Yat Shan Au , Shawn Levesque , Michael Howells , Raja Sekhar Jetti
Abstract: FIG. 1 is a front view of a first image in a sequence of a portion of a display panel with a graphical user interface; and,
FIG. 2 is a second image thereof.
The broken line showing of various regions of a graphical user interface in each of the views form no part of the claimed design. The broken line showing of the display screen is for illustrative purposes only and forms no part of the claimed design.
The appearance of the transitional image sequentially transitions between the images shown in FIGS. 1-2. The process or period in which one image transitions to another image forms no part of the claimed design.-
公开(公告)号：US20230295799A1
公开(公告)日：2023-09-21
申请号：US17696794
申请日：2022-03-16
Applicant: Applied Materials, Inc.
Inventor： Jeffrey Yat Shan Au , Sidharth Bhatia , Zhaozhao Zhu , Nicholas Ryan Pica , Varoujan Chakarian , Chenfei Hu
CPC classification number: C23C16/4401 , G01N21/01 , C23C16/52 , G01N21/94 , G01N2021/0181 , G01N2021/8416
Abstract: A method includes receiving, by a processing device, first data from an optical sensor of a processing chamber. The method further includes processing the first data to obtain second data. The second data includes an indication of a condition of a coating on an interior surface of the processing chamber. The method further includes generating an indication of performance of a processing operation of the processing chamber in view of the second data. The method further includes causing performance of a corrective action in view of the indication of performance of the processing chamber.
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公开(公告)号：US20230238266A1
公开(公告)日：2023-07-27
申请号：US17584322
申请日：2022-01-25
Applicant: Applied Materials, Inc.
Inventor： Patricia Schulze , Gregory John Freeman , Michael Kutney , Arunkumar Ramachandraiah , Chih Chung Chou , Zhaozhao Zhu , Ozkan Celik
IPC: H01L21/68 , H01L21/687 , H01L21/683 , G01B11/24
CPC classification number: H01L21/681 , H01L21/68721 , H01L21/6831 , G01B11/24 , G01B2210/56
Abstract: An apparatus includes a substrate holder, a first actuator to rotate the substrate holder, a second actuator to move the substrate holder linearly, a first sensor to generate one or more first measurements or images of the substrate, a second sensor to generate one or more second measurements of target positions on the substrate, and a processing device. The processing device estimates a position of the substrate on the substrate holder and causes the first actuator to rotate the substrate holder about a first axis. The rotation causes an offset between a field of view of the second sensor and a target position on the substrate due to the substrate not being centered on the substrate holder. The processing device causes the second actuator to move the substrate holder linearly along a second axis to correct the offset. The processing device determines a profile across a surface of the substrate based on the one or more second measurements of the target positions.
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公开(公告)号：US20230168210A1
公开(公告)日：2023-06-01
申请号：US18101869
申请日：2023-01-26
Applicant: Applied Materials, Inc.
Inventor： Blake Erickson , Keith Berding , Michael Kutney , Soumendra Barman , Zhaozhao Zhu , Michelle SanPedro , Suresh Polali Narayana Rao
CPC classification number: G01N21/9501 , G01B11/0616 , G01N21/211
Abstract: A system includes a memory, and at least one processing device, operatively coupled to the memory, to facilitate an etch recipe development process by performing operations including obtaining, from an optical detector, first material thickness data for a first material and second material thickness data for a second material resulting from an iteration of an etch process using an etch recipe. The first material is located at a first reflectometry measurement point and the second material is located at a second reflectometry measurement point different from the first reflectometry measurement point. The operations further include determining one or more etch parameters based on at least the first material thickness data and the second material thickness data.
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Patent Agency Ranking
公开(公告)号：US20230078567A1
公开(公告)日：2023-03-16
申请号：US17447745
申请日：2021-09-15
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Zhaozhao Zhu , Blake W. Erickson , Chunlei Zhang
IPC: G01N21/55
Abstract: Implementations disclosed describe a system including a light source, an optical sensor, and a processing device. The light source directs, during a first time, a probe light into a processing chamber through a window. The light source ceases, during a second time, directing the probe light into the processing chamber through the window. The optical sensor detects, during the first time, a first intensity of a first light. The first light includes a portion of the probe light reflected from the window and a light transmitted from an environment of the processing chamber through the window. The optical sensor detects, during the second time, a second intensity of a second light. The second light includes the light transmitted from the environment of the processing chamber through the window. The processing device determines, using the first intensity and the second intensity, a transmission coefficient of the window.
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公开(公告)号：US20230062206A1
公开(公告)日：2023-03-02
申请号：US18046872
申请日：2022-10-14
Applicant: APPLIED MATERIALS, INC.
Inventor： Thomas Li , Upendra V. Ummethala , Blake Erickson , Prashanth Kumar , Michael Kutney , Steven Trey Tindel , Zhaozhao Zhu
IPC: G03F7/20
Abstract: Spectral data associated with a first prior substrate and/or a second prior substrate is obtained. A metrology measurement value associated with the first portion of the first prior substrate is determined based on one or more metrology measurement values measured for at least one of a second portion of the first prior substrate or a third portion of a second prior substrate. Training data for training a machine learning model to predict metrology measurement values of a current substrate is generated. Generating the training data includes generating a first training input including the spectral data associated with the first prior substrate and generating a first target output for the first training input, the first target output including the determined metrology measurement value associated with the first portion of the first prior substrate. The training data is provided to train the machine learning model.
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公开(公告)号：US20220333989A1
公开(公告)日：2022-10-20
申请号：US17234940
申请日：2021-04-20
Applicant: Applied Materials, Inc.
Inventor： Blake Erickson , Keith Berding , Michael Kutney , Zhaozhao Zhu , Tsung Feng Wu , Michael D. Willwerth , Jeffrey Ludwig
Abstract: An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.
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公开(公告)号：US12136557B2
公开(公告)日：2024-11-05
申请号：US18335899
申请日：2023-06-15
Applicant: APPLIED MATERIALS, INC.
Inventor： Upendra V. Ummethala , Blake Erickson , Prashanth Kumar , Michael Kutney , Steven Trey Tindel , Zhaozhao Zhu
Abstract: A process recipe associated with a substrate at a manufacturing system is identified. A first set of measurements for the substrate is obtained from a substrate measurement subsystem. A second set of measurements for the substrate is obtained from one or more sensors of a chamber of the manufacturing system. A determination is made based on the obtained first set of measurements and the obtained second set of measurements of whether to modify the process recipe by at least one of modifying an operation of the process recipe or generating an instruction to prevent completion of execution of one or more operations of the process recipe.
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公开(公告)号：US20240361239A1
公开(公告)日：2024-10-31
申请号：US18767516
申请日：2024-07-09
Applicant: Applied Materials, Inc.
Inventor： Patrick Tae , Zhaozhao Zhu , Blake W. Erickson , Chunlei Zhang
IPC: G01N21/55
CPC classification number: G01N21/55 , G01N2021/558
Abstract: Implementations disclosed describe a system including a light source, an optical sensor, and a processing device. The light source directs, during a first time, a probe light into a processing chamber through a window. The light source ceases, during a second time, directing the probe light into the processing chamber through the window. The optical sensor detects, during the first time, a first intensity of a first light. The first light includes a portion of the probe light reflected from the window and a light transmitted from an environment of the processing chamber through the window. The optical sensor detects, during the second time, a second intensity of a second light. The second light includes the light transmitted from the environment of the processing chamber through the window. The processing device determines, using the first intensity and the second intensity, a transmission coefficient of the window.
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