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    Ceramic showerheads with conductive electrodes
    1.
    发明授权
    Ceramic showerheads with conductive electrodes 有权

    公开(公告)号：US10920319B2

    公开(公告)日：2021-02-16

    申请号：US16245698

    申请日：2019-01-11

    申请人： Applied Materials, Inc.

    发明人： Laksheswar Kalita ,  Soonam Park ,  Dmitry Lubomirsky ,  Tien Fak Tan ,  LokKee Loh ,  Saravjeet Singh ,  Tae Won Kim

    IPC分类号： C23C16/455 ,  C23C16/34 ,  H01L21/3213 ,  H01J37/32 ,  H01L21/285 ,  C23C16/458

    摘要： Exemplary semiconductor processing chamber showerheads may include a dielectric plate characterized by a first surface and a second surface opposite the first surface. The dielectric plate may define a plurality of apertures through the dielectric plate. The dielectric plate may define a first annular channel in the first surface of the dielectric plate, and the first annular channel may extend about the plurality of apertures. The dielectric plate may define a second annular channel in the first surface of the dielectric plate. The second annular channel may be formed radially outward from the first annular channel. The showerheads may also include a conductive material embedded within the dielectric plate and extending about the plurality of apertures without being exposed by the apertures. The conductive material may be exposed at the second annular channel.

    MULTIPLE CHANNEL SHOWERHEADS
    2.
    发明申请
    MULTIPLE CHANNEL SHOWERHEADS 审中-公开

    公开(公告)号：US20200087788A1

    公开(公告)日：2020-03-19

    申请号：US16132796

    申请日：2018-09-17

    申请人： APPLIED MATERIALS, INC.

    发明人： Tien Fak Tan ,  Saravjeet Singh ,  Tae Won Kim

    IPC分类号： C23C16/455 ,  C23C16/509

    摘要： Exemplary semiconductor showerheads may include a first plate characterized by a first surface in which a plurality of first apertures are defined, and further characterized by a second surface opposite the first surface and from which extends a plurality of annular members. Each annular member of the plurality of annular members may extend from a separate first aperture of the plurality of first apertures. A channel may be defined by each first aperture and corresponding annular member. The showerheads may also include a second plate coupled with the first plate and characterized by a first surface facing the first plate and a second surface opposite the first surface. A plurality of second apertures may be defined through the second plate within an internal area of the second plate. Each annular member of the plurality of annular members may extend within a separate second aperture of the plurality of second apertures.

    Grooved insulator to reduce leakage current
    6.
    发明授权
    Grooved insulator to reduce leakage current 有权

    公开(公告)号：US09659753B2

    公开(公告)日：2017-05-23

    申请号：US14454493

    申请日：2014-08-07

    申请人： Applied Materials, Inc.

    发明人： Tae Cho ,  Sang Won Kang ,  Dongqing Yang ,  Raymond W. Lu ,  Peter Hillman ,  Nicholas Celeste ,  Tien Fak Tan ,  Soonam Park ,  Dmitry Lubomirsky

    IPC分类号： H01J37/32

    CPC分类号： H01J37/3255 ,  H01J37/32082

    摘要： A plasma source includes a first electrode and a second electrode having respective surfaces, and an insulator that is between and in contact with the electrodes. The electrode surfaces and the insulator surface substantially define a plasma cavity. The insulator surface defines one or more grooves configured to prevent deposition of material in a contiguous form on the insulator surface. A method of generating a plasma includes introducing one or more gases into a plasma cavity defined by a first electrode, a surface of an insulator that is in contact with the first electrode, and a second electrode that faces the first electrode. The insulator surface defines one or more grooves where portions of the insulator surface are not exposed to a central region of the cavity. The method further includes providing RF energy across the first and second electrodes to generate the plasma within the cavity.

    Chamber apparatus for chemical etching of dielectric materials
    7.
    发明授权
    Chamber apparatus for chemical etching of dielectric materials 有权

    公开(公告)号：US11302520B2

    公开(公告)日：2022-04-12

    申请号：US14747367

    申请日：2015-06-23

    申请人： Applied Materials, Inc.

    发明人： Tien Fak Tan ,  Dmitry Lubomirsky ,  Kirby H. Floyd ,  Son T. Nguyen ,  David Palagashvili ,  Alexander Tam ,  Shaofeng Chen

    IPC分类号： H01J37/32

    摘要： Implementations of the disclosure generally provide an improved pedestal heater for a processing chamber. The pedestal heater includes a temperature-controlled plate having a first surface and a second surface opposing the first surface. The temperature-controlled plate includes an inner zone comprising a first set of heating elements, an outer zone comprising a second set of heating elements, the outer zone surrounding the inner zone, and a continuous thermal choke disposed between the inner zone and the outer zone, and a substrate receiving plate having a first surface and a second surface opposing the first surface, the second surface of the substrate receiving plate is coupled to the first surface of the temperature-controlled plate. The continuous thermal choke enables a very small temperature gradient to be created and manipulated between the inner zone and the outer zone, allowing center-fast or edge-fast etching profile to achieve on a surface of the substrate.

    CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES
    8.
    发明申请
    CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES 有权

    公开(公告)号：US20210189564A1

    公开(公告)日：2021-06-24

    申请号：US17176411

    申请日：2021-02-16

    申请人： Applied Materials, Inc.

    发明人： Laksheswar Kalita ,  Soonam Park ,  Dmitry Lubomirsky ,  Tien Fak Tan ,  LokKee Loh ,  Saravjeet Singh ,  Tae Won Kim

    IPC分类号： C23C16/455 ,  C23C16/34 ,  H01L21/3213 ,  H01J37/32 ,  H01L21/285 ,  C23C16/458

    摘要： Exemplary semiconductor processing chamber showerheads may include a dielectric plate characterized by a first surface and a second surface opposite the first surface. The dielectric plate may define a plurality of apertures through the dielectric plate. The dielectric plate may define a first annular channel in the first surface of the dielectric plate, and the first annular channel may extend about the plurality of apertures. The dielectric plate may define a second annular channel in the first surface of the dielectric plate. The second annular channel may be formed radially outward from the first annular channel. The showerheads may also include a conductive material embedded within the dielectric plate and extending about the plurality of apertures without being exposed by the apertures. The conductive material may be exposed at the second annular channel.

    Two piece electrode assembly with gap for plasma control
    9.
    发明授权
    Two piece electrode assembly with gap for plasma control 有权

    公开(公告)号：US10699879B2

    公开(公告)日：2020-06-30

    申请号：US15955588

    申请日：2018-04-17

    申请人： Applied Materials, Inc.

    发明人： Tien Fak Tan ,  Saravjeet Singh ,  Dmitry Lubomirsky ,  Tae Wan Kim ,  Kenneth D. Schatz ,  Tae Seung Cho ,  Lok Kee Loh

    IPC分类号： H01J37/32 ,  H01J37/04

    摘要： An apparatus for distributing plasma products includes first and second electrodes that each include planar surfaces. The first electrode forms first apertures from a first planar surface to a second planar surface; the second electrode forms second apertures from the third planar surface to the fourth planar surface. The electrodes couple through one or more adjustable couplers such that the third planar surface is disposed adjacent to the second planar surface with a gap therebetween, the gap having a gap distance. Each of the adjustable couplers has a range of adjustment. The first and second apertures are arranged such that for at least one position within the ranges of adjustment, none of the first apertures aligns with any of the second apertures to form an open straight-line path extending through both the first and second electrodes, and the gap distance is between 0.005 inch and 0.050 inch.