公开(公告)号：US20180155838A1

公开(公告)日：2018-06-07

申请号：US15421964

申请日：2017-02-01

申请人： APPLIED MATERIALS, INC.

发明人： Muhammad M. RASHEED ,  Muhannad MUSTAFA ,  Hamid TAVASSOLI ,  Steven V. SANSONI ,  Cheng-Hsiung TSAI ,  Vikash Banthia

IPC分类号： C23C16/46 ,  H01L21/67 ,  H01L21/687 ,  H01L21/683

CPC分类号： C23C16/46 ,  C23C16/4584 ,  C23C16/4586 ,  H01L21/67103 ,  H01L21/67248 ,  H01L21/6831 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68785

摘要： Embodiments of the present disclosure are directed process kits for use with an in-chamber heater and substrate rotating mechanism. In some embodiments consistent with the present disclosure, a process kit for use with a rotatable substrate support heater pedestal for supporting a substrate in a process chamber may include an upper edge ring including a top ledge and a skirt the extends downward from the top ledge, a lower edge ring that at least partially supports the upper edge ring and aligns the upper edge ring with the substrate support heater pedestal, a bottom plate disposed on a bottom of the process chamber that supports the upper edge ring when the substrate support heater pedestal is in a lowered non-processing position, and a shadow ring that couples with the upper edge ring when the substrate support heater pedestal is in a raised processing position.

公开(公告)号：US20190032210A1

公开(公告)日：2019-01-31

申请号：US15661441

申请日：2017-07-27

申请人： APPLIED MATERIALS, INC.

发明人： Muhannad MUSTAFA ,  Muhammad M. RASHEED ,  Mario Dan SANCHEZ ,  Yu CHANG ,  William Kuang ,  Vinod Konda PURATHE ,  Manjunatha KOPPA

IPC分类号： C23C16/455 ,  G01K7/16 ,  C23C16/458

摘要： Embodiments of the present disclosure are directed to a quick disconnect resistance temperature detector (RTD) heater assembly, that includes a first assembly comprising a pedestal, a pedestal shaft, an adapter, one or more heater power supply terminals, and at least one RTD, and a second assembly comprising a rotating module having a central opening, and a cable assembly partially disposed in the central opening and securely fastened to the rotating module, wherein the first assembly is removably coupled to the second assembly, wherein the cable assembly includes one or more power supply sockets that receive the heater power supply terminals when the first and second assemblies are coupled together, and wherein the cable assembly includes one or more spring loaded RTD pins that contact the at least one RTD disposed in the first assembly when the first and second assemblies are coupled together.

公开(公告)号：US20220064785A1

公开(公告)日：2022-03-03

申请号：US17010518

申请日：2020-09-02

申请人： Applied Materials, Inc.

发明人： Muhannad MUSTAFA ,  Haoyan SHA ,  Muhammad M. RASHEED ,  Chi-Chou LIN ,  Mario D. SILVETTI ,  Bin CAO ,  Shihchung CHEN ,  Yongjing LIN

IPC分类号： C23C16/44

摘要： Embodiments of the present disclosure generally relate chamber lids and methods of using such for gas-phase particle reduction. In an embodiment is provided a chamber lid that includes a top wall, a bottom wall, a plurality of vertical sidewalls, and an interior volume within the chamber lid defined by the top wall, the bottom wall, and the plurality of vertical sidewalls. The chamber lid further includes a plurality of air flow apertures, wherein the plurality of air flow apertures is configured to fluidly communicate air into the interior volume and out of the interior volume, and a mesh disposed on a face of at least one of the air flow apertures of the plurality of air flow apertures. In another embodiment is provided a method of processing a substrate in a substrate processing chamber, the substrate processing chamber comprising a chamber lid as described herein.