公开(公告)号：US20220064785A1

公开(公告)日：2022-03-03

申请号：US17010518

申请日：2020-09-02

申请人： Applied Materials, Inc.

发明人： Muhannad MUSTAFA ,  Haoyan SHA ,  Muhammad M. RASHEED ,  Chi-Chou LIN ,  Mario D. SILVETTI ,  Bin CAO ,  Shihchung CHEN ,  Yongjing LIN

IPC分类号： C23C16/44

摘要： Embodiments of the present disclosure generally relate chamber lids and methods of using such for gas-phase particle reduction. In an embodiment is provided a chamber lid that includes a top wall, a bottom wall, a plurality of vertical sidewalls, and an interior volume within the chamber lid defined by the top wall, the bottom wall, and the plurality of vertical sidewalls. The chamber lid further includes a plurality of air flow apertures, wherein the plurality of air flow apertures is configured to fluidly communicate air into the interior volume and out of the interior volume, and a mesh disposed on a face of at least one of the air flow apertures of the plurality of air flow apertures. In another embodiment is provided a method of processing a substrate in a substrate processing chamber, the substrate processing chamber comprising a chamber lid as described herein.