公开(公告)号：US20200161095A1

公开(公告)日：2020-05-21

申请号：US16749631

申请日：2020-01-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Bharath SWAMINATHAN ,  Hanbing WU ,  John MAZZOCCO

IPC: H01J37/32 ,  H01J37/34 ,  C23C14/50 ,  C23C14/34 ,  H01L21/687 ,  C23C14/54 ,  C23C14/58 ,  H01L21/67

Abstract: Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate anneal chamber includes a chamber body having a chamber wall and an interior volume; a lamp assembly disposed in the interior volume and having a plurality of lamps configured to heat a substrate; a slit valve disposed through a wall of the chamber body and above the lamp assembly to allow the substrate to pass into and out of the interior volume; an annular lamp assembly having at least one lamp disposed in a processing volume in an upper portion of the substrate anneal chamber above the slit valve; and a top reflector disposed above the annular lamp assembly to define an upper portion of the processing volume and to reflect radiation downwards towards the lamp assembly, wherein a bottom surface of the top reflector is exposed to the interior volume.

公开(公告)号：US20180197721A1

公开(公告)日：2018-07-12

申请号：US15402142

申请日：2017-01-09

Applicant: APPLIED MATERIALS, INC.

Inventor： Bharath SWAMINATHAN ,  HANBING WU ,  JOHN MAZZOCCO

IPC: H01J37/32 ,  H01L21/687 ,  C23C14/34 ,  C23C14/50 ,  H01J37/34

Abstract: Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate support includes a substrate support pedestal having an upper surface to support a substrate and an opposing bottom surface, wherein the substrate support pedestal is formed of a material that is transparent to radiation; a lamp assembly disposed below the substrate support pedestal and having a plurality of lamps configured to heat the substrate; a pedestal support extending through the lamp assembly to support the substrate support pedestal in a spaced apart relation to the plurality of lamps; a shaft coupled to a second end of the pedestal support opposite the first end; and a rotation assembly coupled to the shaft opposite the pedestal support to rotate the shaft, the pedestal support, and the substrate support pedestal with respect to the lamp assembly.

公开(公告)号：US20170125274A1

公开(公告)日：2017-05-04

申请号：US15337942

申请日：2016-10-28

Applicant: APPLIED MATERIALS, INC.

Inventor： Bharath SWAMINATHAN ,  Anantha K. Subramani

IPC: H01L21/683 ,  H01R39/60

CPC classification number: H01L21/6833 ,  H01L21/67115 ,  H01L21/68742 ,  H01L21/68785 ,  H01L21/68792 ,  H01R39/60 ,  H01R39/64

Abstract: Embodiments of the present disclosure relate to a rotatable RF coupling device and an electrostatic chuck incorporating the same. In some embodiments, a rotatable RF coupling device includes a conductive plate; a rotatable split cylinder configured to be coupled to a dielectric disk of an electrostatic chuck to provide RF power to one or more RF bias electrodes disposed within the dielectric disk; a plurality of RF input taps coupled to the conductive plate to couple RF power to the conductive plate; a stationary ring coupled to the conductive plate and surrounding the rotatable split cylinder; and a grounded shield surrounding the conductive plate, the stationary ring, and the rotatable split cylinder.