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    Polythiophene/Polyanion Compositions
    2.
    发明公开
    Polythiophene/Polyanion Compositions 审中-公开

    公开(公告)号：US20240279453A1

    公开(公告)日：2024-08-22

    申请号：US18567187

    申请日：2022-06-03

    申请人： Agfa-Gevaert NV

    发明人： Roald Herckens ,  Johan Loccufier

    IPC分类号： C08L25/18 ,  C08F212/32 ,  H01G9/00 ,  H01G9/028

    CPC分类号： C08L25/18 ,  C08F212/32 ,  H01G9/0036 ,  H01G9/028 ,  C08L2201/50 ,  C08L2203/20 ,  C08L2205/02

    摘要： A polythiophene dispersion including: (a) a polythiophene copolymer of a first monomer according to Formula I and a second monomer to Formula II, wherein A represents a substituted or unsubstituted C1 to C5 alkylene bridge further functionalized with at least one functional group selected from the group consisting of a sulfonic acid or salt thereof, a phosphonic acid or salt thereof, a phosphate ester or salt thereof, a sulfate ester or salt thereof and a carboxylic acid or salt thereof; B represents a substituted or unsubstituted C1 to C5 alkylene bridge with the proviso that B is not further functionalized with a pH responsive group; and a molar ratio of the first monomer to the second monomer is from 1/4 to 4/1, (b) a polymeric polyanion wherein at least 75 mol % of the monomeric units of the polymeric polyanion are functionalized with a functional group selected from the group consisting of a sulfonic acid or salt thereof, a phosphonic acid or salt thereof, a phosphate ester or salt thereof, a sulfate ester or salt thereof and a carboxylic acid or salt thereof, characterized in that a molar ratio of the functional groups of the polyanion to the sum of the first and second monomers of the polythiophene copolymer is from 1.1 to 1.75.

    Polythiophene/Polyanion Compositions
    9.
    发明公开
    Polythiophene/Polyanion Compositions 审中-公开

    公开(公告)号：US20240279489A1

    公开(公告)日：2024-08-22

    申请号：US18566238

    申请日：2022-06-03

    申请人： Agfa-Gevaert NV

    发明人： Roald Herckens ,  Johan Loccufier

    IPC分类号： C09D5/24 ,  C08K5/053 ,  C08L25/18 ,  C08L65/00 ,  C09D125/18 ,  C09D165/00 ,  H01G11/26 ,  H01G11/48 ,  H01G11/86

    CPC分类号： C09D5/24 ,  C08L25/18 ,  C08L65/00 ,  C09D125/18 ,  C09D165/00 ,  H01G11/26 ,  H01G11/48 ,  H01G11/86 ,  C08K5/053 ,  C08K2201/001 ,  C08L2201/50

    摘要： A conductive polymer dispersion comprising a polythiophene and a polyanion, characterized in that the polyanion is a homo- or copolymer of amonomer unit according to Formula (I), wherein any of R1 to R5 is selected from the group consisting of hydrogen, a halogen, an ether and a substituted or unsubstituted alkyl group with the proviso that at least one of R1 to R5 is a substituent according to Formula (II), wherein L represents a divalent linking group having less than (20) carbon atoms; n represents 0 or 1; R6 and R7 are independently selected from the group consisting of hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group and a substituted or unsubstituted aryl or heteroaryl group; any of L, R6 and R7 may represent the necessary atoms to form a 5 to 8 membered ring; M represents hydrogen or a counterion to compensate the negative charge of the sulfonate group; the dashed line represents a covalent bond to the phenyl ring of Formula (I).

    Radiation Curable Inkjet Ink for Alkaline Etching or Plating Applications
    10.
    发明申请
    Radiation Curable Inkjet Ink for Alkaline Etching or Plating Applications 有权

    公开(公告)号：US20220267908A1

    公开(公告)日：2022-08-25

    申请号：US17623026

    申请日：2020-06-09

    申请人： AGFA-GEVAERT NV

    发明人： Johan Loccufier

    IPC分类号： C23F1/02 ,  C09D11/101 ,  C09D11/107 ,  C09D11/30 ,  H05K3/06 ,  B29C64/40 ,  B33Y10/00 ,  B33Y40/20

    摘要： A method of manufacturing metallic articles (6) including the steps of: —applying a radiation curable composition comprising a monomer including at least two polymerisable groups on a surface of a substrate thereby forming an image (2); —curing the image; —plating (4) or etching (3) a surface of the substrate not covered by the cured image by means of an alkaline solution; —removing (5) the cured image by means of an acidic solution; characterized in that a linking group between the polymerisable groups comprises at least one acid degradable or hydrolysable group selected from the group consisting of an acetal, a ketal, an orthoester, an orthocarbonate, a tertiary ester, a tertiary carbonate and a tertiary urethane and wherein the composition further comprises less than 10 wt % of other monomers including at least two polymerisable groups relative to the total weight of the polymerisable composition.