公开(公告)号：US09775694B2

公开(公告)日：2017-10-03

申请号：US14561978

申请日：2014-12-05

申请人： ADA FOUNDATION

发明人： Wojtek Tutak

IPC分类号： A61C19/06 ,  B05B7/06 ,  B05B7/16 ,  D01D4/02 ,  D01D5/14 ,  A61L27/18 ,  A61L27/22

CPC分类号： A61C19/06 ,  A61C19/063 ,  A61L27/18 ,  A61L27/222 ,  A61L2400/06 ,  A61L2430/02 ,  A61L2430/12 ,  B05B7/062 ,  B05B7/1606 ,  D01D4/025 ,  D01D4/027 ,  D01D5/14 ,  C08L67/04

摘要： A material deposition device includes a solution supply component, a gas supply component, and a co-axial discharge mechanism. The co-axial discharge mechanism includes a solution discharge mechanism, and a gas discharge mechanism co-axial with the solution discharge mechanism. The material deposition device further includes an alignment component that aligns the solution discharge mechanism in a center of the gas discharge mechanism; and an orifice plate with a number of turbulence inducing structures that induce turbulence in gas exiting the gas discharge mechanism.

公开(公告)号：US20160157978A1

公开(公告)日：2016-06-09

申请号：US14561978

申请日：2014-12-05

申请人： ADA FOUNDATION

发明人： Wojtek Tutak

IPC分类号： A61C19/06 ,  B05D1/02 ,  B05B7/00

CPC分类号： A61C19/06 ,  A61C19/063 ,  A61L27/18 ,  A61L27/222 ,  A61L2400/06 ,  A61L2430/02 ,  A61L2430/12 ,  B05B7/062 ,  B05B7/1606 ,  D01D4/025 ,  D01D4/027 ,  D01D5/14 ,  C08L67/04

摘要： A material deposition device includes a solution supply component, a gas supply component, and a co-axial discharge mechanism. The co-axial discharge mechanism includes a solution discharge mechanism, and a gas discharge mechanism co-axial with the solution discharge mechanism. The material deposition device further includes an alignment component that aligns the solution discharge mechanism in a center of the gas discharge mechanism; and an orifice plate with a number of turbulence inducing structures that induce turbulence in gas exiting the gas discharge mechanism.

摘要翻译： 材料沉积装置包括溶液供应部件，气体供应部件和同轴排出机构。 同轴排放机构包括溶液排出机构和与排液机构同轴的气体排出机构。 所述材料沉积装置还包括对准部件，其将所述溶液排出机构对准所述气体排出机构的中心; 以及具有多个湍流诱导结构的孔板，其导致排出气体排出机构的气体中的湍流。